Asml Netherlands B.v.

Chaitanya Krishna Ande

Johannes Petrus Martinus Bernardus Vermeulen

Johan Hendrik Klootwijk

Pieter-Jan Van Zwol

Paul Janssen

Antonius Franciscus Johannes De Groot

Mária Péter

David Ferdinand Vles

Arnoud Willem Notenboom

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Adrianus Johannes Maria Giesbers

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Evgenia Kurganova

Aleksandar Nikolov Zdravkov

Hrishikesh Patel

Gerrit Van Den Bosch

Peter Simon Antonius Knapen

Hendrikus Jan Wondergem

Johannes Joseph Janssen

Marcel Peter Meijer

Wouter Rogier Meijerink

Raymond Olsman

Dennis De Graaf

Michael Alfred Josephus Kuijken

Mahdiar Valefi

Zomer Silvester Houweling

Thijs Kater

Alexandar Nikolov Zdravkov

Maria Peter

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

EUV pellicles

A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

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Eindhoven, Netherlands

Chaitanya Krishna Ande