Isac Research Inc.

Hyundai Motor Company

Kia Motors Corporation

Chae Woong Kim

Hyung Sang Park

Woong Pyo Hong

Jung Yeon Park

Hyun Seok Cha

Su Han Song

Provided are powder atomic layer deposition (ALD) equipment capable of increasing deposition uniformity of powder by using a gas supply sequence with or without an impeller or a vibration generator, and a gas supply method thereof, the powder ALD equipment including a process chamber having an accommodation space therein to accommodate powder, a gas supplier for sequentially supplying a plurality of gases to the powder, and a gas exhauster for exhausting, to outside, the gases discharged from the process chamber, wherein the gas supplier includes a gas supply plate, a first gas supply line, a first valve, edge valves, and a gas supply sequence controller.

Powder atomic layer deposition equipment and gas supply method therefor

The present disclosure relates to a trap device for a powder coating apparatus. The trap device includes a body part including an inlet through which exhaust gas containing lost powder is introduced, an outlet through which the exhaust gas is discharged, and an interior space in communication with the inlet and the outlet and a trap part that is located in the interior space of the body part and that traps the lost powder contained in the exhaust gas by a magnetic force.

Trap device for powder coating apparatus

Growing community of inventors

Daejeon, South Korea

Chae Woong Kim