Motorola Corporation

Chad B Bray

James F Vanell

A method of manufacturing a semiconductor component includes forming a first layer over a semiconductor substrate, providing a mixture comprised of a first component and a second component, optically detecting a concentration of the first component in the mixture, and applying the mixture to the first layer. A chemical-mechanical polishing (CMP) system (,) for use in the method includes a vessel (,) having a first input port (,), a CMP slurry output port (,), and a CMP slurry sensing port (,). The CMP system also includes a refractometer (,) adjacent to the CMP slurry sensing port.

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Chandler, AZ, United States of America

Chad B Bray