Samsung Electronics Co., Ltd.

Cha-won Ko

Jin-Kyu Han

Hyun-woo Kim

Youn-Joung Cho

A method of forming a semiconductor device includes forming an etching layer on a substrate, forming a photoresist layer on the etching layer, forming an exposed area configured to define an unexposed area in the photoresist layer, forming a hardmask layer on the exposed area using a selective deposition process, partially removing the photoresist layer using the hardmask layer as an etch mask and forming a photoresist pattern, and etching the etching layer using the photoresist pattern as an etch mask and forming a fine pattern.

Growing community of inventors

Yongin-si, South Korea

Cha-won Ko