Asml Netherlands B.v.

Cédric Désiré Grouwstra

Alexander Ypma

Richard Moerman

Weitian Kou

Hakki Ergün Cekli

Youri Johannes Laurentius Maria Van Dommelen

Marc Hauptmann

Erik Johannes Maria Wallerbos

Stefan Cornelis Theodorus Van Der Sanden

Willem Seine Christian Roelofs

Michiel Kupers

David Frans Simon Deckers

Erik Henri Adriaan Delvigne

Lydia Marianna Vergaij-Huizer

Iryna Dovbush

Manuel Giollo

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Erik Henricus Egidius Catharina Eummelen

Marcel Beckers

Paulus Martinus Maria Liebregts

Danny Maria Hubertus Philips

Pieter Mulder

Sarathi Roy

Clemens Johannes Gerardus Van Den Dungen

Evert Van Vliet

Nicolaas Franciscus Koppelaars

Dirk De Vries

Remko Jan Peter Verhees

Arie Jeffrey Den Boef

Maurits Van Der Schaar

Arno Jan Bleeker

Nicolaas Rudolf Kemper

Antoine Gaston Marie Kiers

Henricus Petrus Maria Pellemans

Mircea Dusa

Markus Gerardus Martinus Maria Van Kraaij

Marinus Jochemsen

Norbertus Josephus Martinus Van Den Nieuwelaar

Paul Frank Luehrmann

Georgios Tsirogiannis

Dimitra Gkorou

Robert Jan Van Wijk

Hua Li

Tzu-Chao Chen

Jelle Nije

Frans Reinier Spiering

Bob Streefkerk

Wim Tjibbo Tel

Johannes Anna Quaedackers

Manouk Rijpstra

Cornelis Johannes Henricus Lambregts

Rizvi Rahman

Pieter Gerardus Jacobus Smorenberg

Jeroen Hubert Rommers

Rik Vangheluwe

Michel Franciscus Johannes Van Rooy

Thijs Egidius Johannes Knaapen

Chi-Fei Nien

Chang-Wei Chen

Ralf Martinus Marinus Daverveld

Hakki Ergun Cekli

A device manufacturing method, the method comprising: obtaining a measurement data time series of a plurality of substrates on which an exposure step and a process step have been performed; obtaining a status data time series relating to conditions prevailing when the process step was performed on at least some of the plurality of substrates; applying a filter to the measurement data time series and the status data time series to obtain filtered data; and determining, using the filtered data, a correction to be applied in an exposure step performed on a subsequent substrate.

Device manufacturing methods

A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Method and apparatus for angular-resolved spectroscopic lithography characterization

A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.

Optimizing an apparatus for multi-stage processing of product units

A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Computational metrology based correction and control

Methods of determining corrections for a patterning process

An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Lithographic apparatus

A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus

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Eindhoven, Netherlands

Cédric Désiré Grouwstra