Bell Telephone Laboratories

Cesar D Capio

Hyman J Levinstein

Ashok K Sinha

Arthur C Adams

David N Wang

Shyam P Murarka

Cyril J Mogab

Richard S Wagner

Frank B Alexander, Jr

Victor Emerald Hauser, Jr

The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing such films. The resulting structures are sufficiently distortion free to be useful for x-ray lithography.

Radiation mask structure

Disclosed is a method and structure for protecting circuit components from the ambient and in particular for protecting the contact metal from the adverse effects of moisture. A first layer of amorphous silicon is deposited over the circuit including the metal contacts. A second layer which may be silicon nitride or silicon dioxide is then deposited over the amorphous silicon. The amorphous silicon layer reduces cracking in the second layer and prevents cracks in the second layer from propagating to the circuit components.

Passivation of metallized semiconductor substrates

An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.

Radial flow reactor including glow discharge limiting shield

Growing community of inventors

Fords, NJ, United States of America

Cesar D Capio