Arkema France

Centre National De La Recherche Scientifique

Universitë De Bordeaux

Institut Polytechnique De Bordeaux

Celia Nicolet

Christophe Navarro

Raluca Tiron

Xavier Chevalier

Eric Cloutet

Ilias Iliopoulos

Hubert Teyssedre

Georges Hadziioannou

Cyril Brochon

Karim Aissou

Muhammad Mumtaz

Florian Delachat

Guillaume Fleury

A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

Process for transfer imprinting

A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium.

Method for controlling the synthesis of a block copolymer containing at least one nonpolar block and at least one polar block and use of said block copolymer in applications of nanolithography by direct self-assembly

The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.

Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film

The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

Process for controlling the period of a nanostructured block copolymer film based on styrene and on methyl methacrylate, and nanostructured block copolymer film

The present invention relates to a process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co)polymers of one of the blocks on a surface employing a particular way of carrying out the synthesis of the blend of block copolymers and of (co)polymers of one of the blocks.

Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of co(polymers) of one of the blocks

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Talence, France

Celia Nicolet