Riber

Catherine Chaix

Jean Fompeyrine

Jean-Pierre A Locquet

Jerome Villette

Heinz Siegwart

Pierre-André Nutte

Alain Jarry

Valerick Cassagne

Jérome Villette

The invention concerns a material evaporation chamber including a vacuum chamber (), a first pumping unit () to pump said chamber and sources of material. According to the invention, a wall () liable to provide total or partial vacuum tightness, delineates within this chamber a first volume () and a second volume (). Certain sources of material () having a main axis () are placed in the second volume (). This second volume () is pumped by a second pumping unit (). The wall () includes recesses () which are each centered on the main axis () of one of the sources of material (). The evaporation chamber also comprises means () for plugging or clearing each of said recesses (), said means () being controlled individually to protect the sources of material () having a main axis () unused.

Material evaporation chamber with differential vacuum pumping

Disclosed is an apparatus for depositing a thin film of material on a substrate and a regeneration process. The apparatus includes a chamber, a cryogenic panel disposed inside the chamber, a sample holder able to support a substrate, a gas injector able to inject a gaseous precursor into the chamber, a first trap connected to the vacuum chamber and able to trap a part of the gaseous precursor released by the cryogenic panel, the first trap having a fixed pumping capacity S. The apparatus for depositing a thin film of material on a substrate includes a second trap having a variable pumping capacity Sable to be regulated in function of the gaseous precursor partial pressure, the first and second trap providing a total pumping capacity S=S+Ssufficient to maintain the gaseous precursor partial pressure in the vacuum chamber under a determined pressure P.

Apparatus for depositing a thin film of material on a substrate and regeneration process for such an apparatus

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La Celle Saint Cloud, France

Catherine Chaix