Asml Netherlands B.v.

Casper Roderik De Groot

Erik Henricus Egidius Catharina Eummelen

Yuri Johannes Gabriël Van De Vijver

Norbertus Josephus Martinus Van Den Nieuwelaar

Jorge Alberto Vieyra Salas

Bert Dirk Scholten

Pieter Lein Joseph Gunter

Victor Manuel Blanco Carballo

Ronald Frank Kox

David Merritt Phillips

Frederik Antonius Van Der Zanden

Marijn Wouters

Rolf Hendrikus Jacobus Custers

Johannes Henricus Wilhelmus Jacobs

Marco Koert Stavenga

Richard Joseph Bruls

Paulus Martinus Maria Liebregts

Youri Johannes Laurentius Maria Van Dommelen

Jan Cornelis Van Der Hoeven

Gert-Jan Gerardus Johannes Thomas Brands

Rudy Jan Maria Pellens

Marcus Johannes Van Der Zanden

Coen Cornelis Wilhelmus Verspaget

David Lucien Anstotz

Vijay Kumar Badam

Thijs Egidius Johannes Knaapen

Rudolf Adrianus Joannes Maas

Martijn Hendrik Kamphuis

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

Lithography apparatus and method of manufacturing a device

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Casper Roderik De Groot