Matheson Tri-gas, Inc.

Nanoproducts Corporation

Alliance for Sustainable Energy, LLC

Carrie L Wyse

Robert Torres, Jr

Joseph V Vininski

Tadaharu Watanabe

Tapesh K Yadav

Clayton Kostelecky

Anthony Vigliotti

Andrew Millward

Hans Heinrich Funke

Mark Raynor

Teresa M Barnes

Tim Gessert

Xiaonan Li

Praveen Jha

Glenn Mitchell

Ramkumar Subramanian

Tadaharu Wantanbe

Dan Davia

The molecular etcher carbonyl fluoride (COF) or any of its variants, are provided for, according to the present invention, to increase the efficiency of etching and/or cleaning and/or removal of materials such as the unwanted film and/or deposits on the chamber walls and other components in a process chamber or substrate (collectively referred to herein as 'materials'). The methods of the present invention involve igniting and sustaining a plasma, whether it is a remote or in-situ plasma, by stepwise addition of additives, such as but not limited to, a saturated, unsaturated or partially unsaturated perfluorocarbon compound (PFC) having the general formula (CF) and/or an oxide of carbon (CO) to a nitrogen trifluoride (NF) plasma into a chemical deposition chamber (CVD) chamber, thereby generating COF. The NFmay be excited in a plasma inside the CVD chamber or in a remote plasma region upstream from the CVD chamber. The additive(s) may be introduced upstream or downstream of the remote plasma such that both NFand the additive(s) (and any plasma-generated effluents) are present in the CVD chamber during cleaning.

In-situ generation of the molecular etcher carbonyl fluoride or any of its variants and its use

Methods of forming a conductive fluorine-doped metal oxide layer on a substrate by chemical vapor deposition are described. The methods may include heating the substrate in a processing chamber, and introducing a metal-containing precursor and a fluorine-containing precursor to the processing chamber. The methods may also include adding an oxygen-containing precursor to the processing chamber. The precursors are reacted to deposit the fluorine-doped metal oxide layer on the substrate. Methods may also include forming the conductive fluorine-doped metal oxide layer by plasma-assisted chemical vapor deposition. These methods may include providing the substrate in a processing chamber, and introducing a metal-containing precursor, and a fluorine-containing precursor to the processing chamber. A plasma may be formed that includes species from the metal-containing precursor and the fluorine-containing precursor. The species may react to deposit the fluorine-doped metal oxide layer on the substrate.

Fluorine compounds for doping conductive oxide thin films

A method of reducing moisture in a fluorine-containing gas is described. The method may include the steps of providing a purifier material that includes elemental carbon, and flowing the unpurified fluorine-containing gas having an unpurified moisture concentration over or through the carbon-based purifier material. At least a portion of the moisture is captured in the purifier material so that a purified fluorine-containing gas that emerges downstream of the purifier material has a reduced moisture concentration that is about 50% or less of the unpurified moisture concentration.

Purification of fluorine containing gases and systems and materials thereof

A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. The vessel contains an ionic liquid therein. The fluid is contacted with the ionic liquid for take-up of the fluid by the ionic liquid. There is substantially no chemical change in the ionic liquid and the fluid. The fluid is released from the ionic liquid and dispensed from the vessel.

Fluid storage and purification method and system

A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. A polymerized polymeric material is provided within the vessel. The fluid is contacted with the polymerized polymeric material for take-up of the fluid by the polymerized polymeric material. The fluid is released from the polymerized polymeric material and dispensed from the vessel.

Polymerized polymeric fluid storage and purification method and system

Fluid storage and purification method

A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. A solvent mixture comprising an ionic liquid and a cosolvent is provided within the vessel. The fluid is contacted with the solvent mixture for take-up of the fluid by the solvent mixture. The fluid is released from the ionic liquid and dispensed from the vessel.

Trace impurities such as organic compounds in an inert, non-reactive or reactive liquid such as ammonia, hydrogen chloride, hydrogen bromide, and chlorine are reduced by at least a factor of 5 using liquid purifying systems that contain an ultra-low emission (ULE) carbon. The moisture level of the purified reactive liquid is only slightly higher than that of the contaminated liquid.

Composition for removing trace impurities from inert, non-reactive and reactive liquids

Methods for lowering processing and raw material costs are disclosed. Specifically, the use of nanostructured powders is disclosed for faster and lower sintering temperatures whereby electrodes currently employing platinum can be substituted with lower melting point metals and alloys.

Reducing manufacturing and raw material costs for device manufacture with nanostructured powders

This invention describes a method of rapidly monitoring the temperature of a medium and a method of preparing a quantum confined device that can enable such measurements. The monitoring principle uses changes in impedance of nanostructured devices, i.e. devices in which one or more materials have the domain size precision engineered to less than 500 nanometers, preferably to dimensions less than the domain sizes where quantum confinement effects become significant and modify the electrical or thermal properties of the materials. The invention can be used to monitor absolute values of and changes in temperature of gases, inorganic and organic liquids, solids, suspensions, and mixtures of one or more of the said phases. The invention can be used to monitor radiation, power, heat and mass flow, charge and momentum flow, and phase transformation.

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Longmont, CO, United States of America

Carrie L Wyse