Massachusetts Institute of Technology

Komag Corporation

Caroline Anne Ross

Karl Kimon Berggren

Martin Philip Rosenblum

Gerald Francis Dionne

Fernando J Castano

Yeon Sik Jung

Peng-Wei Chuang

Lei Bi

Rajiv Yadav Ranjan

Lionel Cooper Kimerling

Henry Ignatius Smith

Marc A Baldo

Tu Chen

Juejun Hu

David Treves

Steven Jay Spector

Bernhard Vogeli

Reuel Bennett Swint

Juan Montoya

Hong K Choi

Ytshak Avrahami

Joel K W Yang

Jae-Byum Chang

Dong Hun Kim

Amir Tavakkoli Kermani Ghariehali

Kuo H Huang

Samuel Mospens Nicaise

Xueyin Sun

Kevin Willy Gotrik

Hyun Suk Kim

Timothy A Savas

Jean Anne Currivan Incorvia

Tamar Tepper

Mehmet Cengiz Onbasli

Adam F Hannon

Peng Jiang

Methods for forming magneto-optical films for integrated photonic devices and integrated photonic devices incorporating same are described. An optical isolator or any nonreciprocal photonic component for an integrated photonic device can be fabricated by depositing a functional garnet layer directly onto a non-garnet substrate; depositing a seed garnet layer on the functional garnet layer; and after depositing both the functional garnet layer and the seed layer performing an annealing process. Since the seed garnet layer crystalizes faster than the functional garnet layer, crystallization of the functional garnet layer can be accomplished directly on the non-garnet substrate during a single annealing step for the seed layer and the functional garnet layer.

Method for forming magneto-optical films for integrated photonic devices

A sacrificial-post templating method is presented for directing block copolymer (BCP) self-assembly to form nanostructures of monolayers and bilayers of microdomains. The topographical post template can be removed after directing self-assembly and, therefore, is not incorporated into the final microdomain pattern. The sacrificial posts can be a material removable using a selective etchant that will not remove the material of the final pattern block(s). The sacrificial posts may be removable, at least in part, using a same etchant as for removing one of the blocks of the BCP, for example, a negative tone polymethylmethacrylate (PMMA) when a non-final pattern block of polystyrene is removed and polydimethylsiloxane (PDMS) remains on the substrate.

Removable templates for directed self assembly

A logic gate device is disclosed. The logic gate device structure can include a magnetic tunnel junction on a soft ferromagnetic wire to provide a readout. One input contact can be at one end of the soft ferromagnetic wire and a second input contact can be at the other end of the soft ferromagnetic wire to control domain wall position in the soft ferromagnetic wire.

Low energy magnetic domain wall logic device

This disclosure relates generally to systems and methods of providing standardized topographical configurations for template regions. In one embodiment, a set of array arrangements is selected. Arrays of template structures are then formed on at least one substrate. Each of the arrays is arranged in accordance with an array arrangement in the set of array arrangements such that the arrays correspond surjectively onto the set of array arrangements. After the arrays are formed, a self-assembly material is provided on the arrays. Self-assembly patterns formed by self-assembling material as a result of the arrays may be empirically observed and used to map a set of self-assembly pattern arrangements surjectively onto the set of array arrangements. Using this mapping, a combination of the self-assembly pattern arrangements that match a target pattern arrangement can be used to select a combination of array arrangements from the set of array arrangements for a template region.

Standardized topographical arrangements for template regions that orient self-assembly

A patterned nonreciprocal optical resonator structure is provided that includes a resonator structure that receives an optical signal. A top cladding layer is deposited on a selective portion of the resonator structure. The top cladding layer is patterned so as to expose the core of the resonator structure defined by the selective portion. A magneto-optically active layer includes a magneto-optical medium being deposited on the exposed core of the resonator structure so as to generate optical non-reciprocity.

Patterned non-reciprocal optical resonator

An optical structure for generating nonreciprocal loss is provided that includes a first substrate layer and a magneto-optical layer positioned on the first substrate layer. The magneto-optical layer achieves nonreciprocity with application of an external magnetic field so as to produce resonantly enhanced nonreciprocal loss.

On-chip miniature optical isolator

A magnetoresistive Wheatstone-bridge structure includes a magnetoresistive ring structure. The magnetoresistive ring structure includes a first magnetic layer comprising a ferromagnetic material. A second magnetic layer also includes a ferromagnetic material. A non-magnetic spacer is positioned between the first magnetic layer and the second magnetic layer. A vacant open region is positioned in the center region of the magnetoresistive ring structure. A plurality of magnetic states can exist in either the first magnetic layer or second magnetic layer. Furthermore, the magnetoresistive Wheatstone-bridge structure includes a plurality of voltage and current contacts arranged symmetrically upon the magnetoresistive ring structure. The magnetic state of the ring is detected by measuring its resistance.

Wheatstone-bridge magnetoresistive device

Complex self-assembled patterns can be created using a sparse template and local changes to the shape or distribution of the posts of the template to direct pattern generation of block copolymer. The post spacing in the template is formed commensurate with the equilibrium periodicity of the block copolymer, which controls the orientation of the linear features. Further, the posts can be arranged such that the template occupies only a few percent of the area of the final self-assembled patterns. Local aperiodic features can be introduced by changing the period or motif of the lattice or by adding guiding posts. According to one embodiment, an array of carefully spaced and shaped posts, prepared by electron-beam patterning of an inorganic resist, can be used to template complex patterns in a cylindrical-morphology block copolymer. These complex self-assembled patterns can form a mask used in fabrication processes of arbitrary structures such as interconnect layouts.

Guided self-assembly of block copolymer line structures for integrated circuit interconnects

The present invention relates to the self-assembly of a spherical-morphology block copolymer into V-shaped grooves of a substrate. Although spherical morphology block copolymers typically form a body-centered cubic system (bcc) sphere array in bulk, the V-shaped grooves promote the formation of a face-centered cubic system (fcc) sphere array that is well ordered. In one embodiment, the (111) planes of the fcc sphere array are parallel to the angled side walls of the V-shaped groove. The (100) plane of the fcc sphere array is parallel to the top surface of the substrate, and may show a square symmetry among adjacent spheres. This square symmetry is unlike the hexagonal symmetry seen in monolayers of spherical domains and is a useful geometry for lithography applications, especially those used in semiconductor applications.

Formation of close-packed sphere arrays in V-shaped grooves

Disclosed is a structure made of a trench patterned substrate having a pre-determined trench period and a pre-determined mesa to trench width ratio, and a block copolymer on top of the trench patterned substrate. The block copolymer has at least an organic block and a silicon-containing block, wherein the block copolymer can have either perpendicular or parallel cylinders. The structure is annealed under a pre-determined vapor pressure for a predetermined annealing time period, wherein the pre-determined trench period, the pre-determined mesa to trench width ratio, the predetermined vapor pressure and the predetermined annealing time period are chosen such that cylinders formed in the block copolymer are either perpendicular or parallel with respect to the trench-patterned substrate. A method is also described to form the above-mentioned structure.

Orientation-controlled self-assembled nanolithography using a block copolymer

A magneto-optical structure is provided. The magneto-optical structure includes a substrate. A waveguide layer is formed on the substrate for guiding electromagnetic radiation received by the magneto-optical structure. The waveguide layer includes magnetic oxide material that comprises ABOperovskite doped with transition metal ions on the B site, or transition metal ions doped SnO, or transition metal ions doped CeO.

Magnetic material for magneto-optical isolator

A micro-fabricated structure and method of forming a micro-fabricated structure are disclosed. The method includes the steps of forming a first pattern in a first photo-resist, transferring the first pattern in the first photo-resist to a mask layer, forming a second pattern in a second photo-resist, and transferring the second pattern in the second photo-resist to the mask layer. In various embodiments, the method may further include the steps of forming a first pattern in a first photo-resist, forming a second pattern in a second photo-resist, and transferring the first and second patterns to a target layer.

System and method for performing multi-resolution lithography

An optical isolator is provided. The optical isolator includes a substrate and a thin film is formed comprising of iron oxide or magnetic persovskite-type material having a high Faraday rotation.

Magnetooptical isolator material

A magnetic-ring structure includes at least two states, and at least one twisted state that includes a 360&#xb0; domain wall that can exist over a wide range of applied fields.

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Arlington, MA, United States of America

Caroline Anne Ross