Saes Getters S.p.a.

Other

Carolina Solcia

Marco Succi

Giorgio Vergani

Antonio Coppola

D'Arcy H Lorimer

Fabrizio Doni

A method for removing oxygen from ammonia at low temperature is described. In one embodiment, oxygen contaminated ammonia is contacted with a getter material that includes iron and manganese that sorbs oxygen to yield ammonia that is substantially oxygen free. In one embodiment, the process of contacting ammonia with the getter material takes place at about 25&#xb0; C. In another embodiment the weight ratio between iron and manganese is about 7:1. In another embodiment, the getter material is dispersed on an inert support of specific surface greater than 100 m/g. In one embodiment, impure ammonia is contacted with getter material including iron and manganese that sorbs oxygen and with a drying agent that absorbs water to yield deoxygenated anhydrous ammonia. In yet another embodiment, an apparatus consisting of a gas inlet, gas purification chamber and gas outlet that deoxygenates ammonia when charged with getter material that includes iron and manganese is described. In one embodiment, getter material and drying agent are mixed together inside the gas purification chamber. In another aspect a method for producing semiconductor devices with high purity ammonia is described.

Method for deoxygenating ammonia with reduced oxides of iron and manganese

A method for removing oxygen from ammonia at low temperature is described. In one embodiment, oxygen contaminated ammonia is contacted with a getter material that includes iron and manganese that sorbs oxygen to yield ammonia that is substantially oxygen free. In one embodiment, the process of contacting ammonia with the getter material takes place at about 25&deg; C. In another embodiment the weight ratio between iron and manganese is about 7:1. In another embodiment, the getter material is dispersed on an inert support of specific surface greater than 100 m /g. In one embodiment, impure ammonia is contacted with getter material including iron and manganese that sorbs oxygen and with a drying agent that absorbs water to yield deoxygenated anhydrous ammonia. In yet another embodiment, an apparatus consisting of a gas inlet, gas purification chamber and gas outlet that deoxygenates ammonia when charged with getter material that includes iron and manganese is described. In one embodiment, getter material and drying agent are mixed together inside the gas purification chamber. In another aspect a method for producing semiconductor devices with high purity ammonia is described.

Getter materials for deoxygenating ammonia/oxygen gas mixtures at low temperature

Hydrogen purification

A method for removing oxygen from ammonia at low temperature is described. In one embodiment, oxygen contaminated ammonia is contacted with a getter material that includes iron and manganese that sorbs oxygen to yield ammonia that is substantially oxygen free. In one embodiment, the process of contacting ammonia with the getter material takes place at about 25.degree. C. In another embodiment the weight ratio between iron and manganese is about 7:1. In another embodiment, the getter material is dispersed on an inert support of specific surface greater than 100 m.sup.2/ g. In one embodiment, impure ammonia is contacted with getter material including iron and manganese that sorbs oxygen and with a drying agent that absorbs water to yield deoxygenated anhydrous ammonia. In yet another embodiment, an apparatus consisting of a gas inlet, gas purification chamber and gas outlet that deoxygenates ammonia when charged with getter material that includes iron and manganese is described. In one embodiment, getter material and drying agent are mixed together inside the gas purification chamber. In another aspect a method for producing semiconductor devices with high purity ammonia is described.

Getter materials for deoxygenating ammonia/oxygen gas mixtures at low

An improved apparatus and process for the removal of gaseous impurities from an impure gas stream of hydrogen contaminated with carbon monoxide, and with one or more additional impurities such as carbon dioxide, oxygen, nitrogen, water, methane. The impure gas stream is first contacted with elemental nickel in a first reaction zone under nickel-carbonyl forming conditions thereby converting substantially all the carbon monoxide to nickel carbonyl, thereby producing a partially purified gas stream. The partially purified gas stream is then contacted with Ti.sub.2 Ni or certain manganese-containing alloys in a second reaction zone to produce a fully purified gas stream.

An apparatus for accurately measuring the water content of a moist gas containing less than 50 parts per million (ppm) of water comprises an isothermal heat-sink (14), a radiator (20), a Peltier heater-cooler (24) thermally arranged between the isothermal heat-sink (14) and the radiator (20). The heater-cooler (24) is transferring heat from the isothermal heat-sink (14) to the radiator (20) and vice versa. A phosphoric acid moisture cell (32) is in thermal contact with the isothermal heat-sink (14). Upon passing the moist gas through the cell (32) the amount of moisture in the moist gas is measured as variation of electrical current throughout the cell.

Apparatus for accurately measuring the water content of gases

A calibrating apparatus for isothermally introducing, into a stream of dry gas, amounts of moisture lower than 1000 ppb, said apparatus comprising:

Calibrating apparatus for isothermally introducing moisture into a

A gas purifier for impure gas having an end of life detector. The purifier has:

Gas purifier having pressure responsive switch as end of life detector

A method, based on the measurement of electrical resistance, and an apparatus for performing the measurement, which indicates the moment in which a gas purifier is about to loose its purification efficiency. The gas purifier can therefore be substituted before the impurity levels in the purified gas output reach undesirably high values.

Method for determining the end of useful life of a gas purifier and

A gas purifier for impure gas is provided with a sensor of the end of useful life. The purifier has a housing completely filled with a gas sorbing material. The gas sorbing material is capable of reacting with the impurities contained within the impure gas. This reaction results in an expansion of the gas sorbing material which thereby causes the housing to expand. The purifier also has an impure gas inlet and a purified gas outlet as well as a strain gauge carried by the housing and means for determining the strain on the strain gauge thus determining the end of useful life of the gas sorbing material.

Growing community of inventors

Milan, Italy

Carolina Solcia