Lpe S.p.a.

Carmelo Vecchio

Franco Preti

Vincenzo Ogliari

Danilo Crippa

Francesco Corea

Marco Mauceri

Marco Puglisi

Laura Gobbo

The present invention mainly relates to a susceptor for a reactor for epitaxial growth, comprising: a disc-shaped body () having a first face and a second face, wherein the first face comprises at least one zone () adapted to receive a substrate () to be subjected to epitaxial growth and at least one supporting element () for the substrate (), located at the zone (); the supporting element () comprises a circular disc () with an edge () which is raised with respect to the disc; the zone () may be a bottom of a recess () or a top of a relief of the disc-shaped body (); the disc-shaped body () is solid at least at the recess () or relief; the edge is accessible from a side of the susceptor for handling the supporting element.

Susceptor with supporting element

A reaction chamber of a reactor for epitaxial growth includes a wall () with a recess and a susceptor () comprising a body and a relief. The body is placed in said recess in a rotational manner with respect to said wall (). The chamber includes a discoid supporting element (), having a shape adapted to be laid stably on said relief, having a size such to protrude radially from said relief and adapted to support one or more substrates to be subjected to epitaxial growth. The chamber also includes a flat covering () located over said wall () and a hole () at said discoid supporting element (). The shape of said hole () corresponds to the shape of said discoid supporting element (). The covering () has at least one hollow guide () for the passage of a device () for loading/unloading said discoid supporting element (), wherein said hollow guide () extends from an edge of said covering () to said hole ().

Reaction chamber for epitaxial growth with a loading/unloading device and reactor

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Baranzate, Italy

Carmelo Vecchio