Motorola Corporation

Motorla, Inc.

Carlos A Mazure

Jon T Fitch

Keith E Witek

James D Hayden

Scott S Roth

Kent J Cooper

Wayne J Ray

Jung-Hui Lin

Bich-Yen Nguyen

Marius K Orlowski

Michael P Woo

Bernard J Roman

Dean J Denning

Matthew S Noell

A vertically raised transistor (10) is formed having a substrate (12). A conductive plug region (22) is selectively or epitaxially formed to vertically elevate the transistor (10). A first doped region (16a) and a second doped region (16b) are each electrically coupled to the conductive plug region (22) via sidewall contacts. The doped regions (16a and 16b) are used to form current electrode regions (26) within the conductive plug region (22). A channel region separates the current electrodes (26). A gate dielectric layer (28) is formed to overlie the channel region. A conductive layer (30) is formed to overlie the gate dielectric layer (28). Conductive layer (30) forms a gate electrode for the transistor (10). The vertical raised transistor (10) and conductive plug region (22) provide improved device isolation and improved device operation.

Vertical transistor structure

A transistor (10) has a substrate (12) and a diffusion (14). A gate conductive layer (18) overlies the substrate (12) and has a sidewall formed by an opening that exposes the substrate (12). A sidewall dielectric layer (22) formed laterally adjacent the conductive layer (18) sidewall functions as a gate dielectric for the transistor (10). A conductive region is formed within the opening. The conductive region has a first current electrode region (28) and a second control electrode region (34) and a channel region (30) laterally adjacent the sidewall dielectric layer (22). A plurality of transistors, each in accordance with transistor (10), can be stacked in a vertical manner to form logic gates such as NMOS or PMOS NAND, NOR, and inverter gates, and/or CMOS NAND, NOR, and inverter gates with one or more inputs.

Vertically stacked vertical transistors used to form vertical logic gate

A vertical transistor (10) has a substrate (12) and a control electrode conductive layer (18), which functions as a control or gate electrode. A sidewall dielectric layer (22) is formed laterally adjacent the control electrode conductive layer (18) and overlying the substrate (12). The conductive layer (18) at least partially surrounds a channel region (30). A vertical conductive region is formed within a device opening wherein a bottom portion of the conductive region is a first current electrode (28). A middle portion of the vertical conductive region is the channel region (30). A top portion of the vertical conductive region is a second current electrode (34).

Vertically oriented DRAM structure

A contact is formed in a semiconductor device (10), independent of underlying topography or pitch. In one method of the present invention, an insulating layer (18) is deposited over a semiconductor substrate (12). An etch stop layer (20) is deposited over the insulating layer. A frame structure (22) is formed on the etch stop material and defines at least one contact region (23 and/or 25) within which the etch stop material is exposed. The exposed portions of the etch stop material are removed from the contact region to expose a portion of the insulating layer. The exposed portion of the insulating layer is then anisotropically etched and at least one contact (30 and/or 32) is formed in the contact region. Depending on where the contact region is positioned, either a self-aligned contact or a non-self-aligned contact may be formed, or both types of contacts may be formed simultaneously.

Method for forming contact to a semiconductor device

Method for forming a dynamic contact which can be either on or off or

A vertical transistor (10) has a substrate (12) and a control electrode conductive layer (18), which functions as a control or gate electrode. A sidewall dielectric layer (22) is formed laterally adjacent the control electrode conductive layer (18) and overlying the substrate (12). The conductive layer (18) at least partially surrounds a channel region (30). A vertical conductive region is formed within a device opening wherein a bottom portion of the conductive region is a first current electrode (28). A middle portion of the vertical conductive region is the channel region (30). A top portion of the vertical conductive region is a second current electrode (34). A capacitor (69) is formed overlying and coupled to the vertical transistor (10) in order to form a dynamic random access memory (DRAM) cell.

Method for forming a vertically integrated dynamic memory cell

Dynamic memory device having a vertical transistor

A method for forming a vertical transistor (10) begins by providing a substrate (12). A conductive layer (16) is formed overlying the substrate (12). A first current electrode (26), a second current electrode (30), and a channel region (28) are each formed via one of either selective growth, epitaxial growth, in-situ doping, and/or ion implantation. A gate electrode or control electrode (34) is formed laterally adjacent the channel region (28). A selective/epitaxial growth step is used to connect the conductive layer (16) to the control electrode (34) and forms a control electrode interconnect which is reliable and free from electrical short circuits to the current electrodes (26 and 30). The transistor (10) may be vertically stacked to form compact inverter circuits.

Vertical transistor having an underlying gate electrode contact

A semiconductor memory device is formed having a substrate (12). A diffusion (14) is formed within the substrate (12). A first vertical transistor stack (122) is formed. A second vertical transistor stack (124) is formed. The first vertical transistor stack (122) has a transistor (100) underlying a transistor (104). The second vertical transistor stack (124) has a transistor (102) underlying a transistor (106). The transistors (100 and 104) are connected in series, and the transistors (102 and 106) are connected in series. In a preferred form, transistors (100 and 102) are electrically connected as latch transistors for a semiconductor memory device and transistors (106 and 104) are connected as pass transistors. Two vertical stacks (126 and 128) form electrical interconnections (118 and 120) and resistive devices (134 and 138) for the semiconductor memory device.

Vertically formed semiconductor random access memory device

Method for forming a compact transistor structure

A transistor is formed as either a bipolar transistor (10) or an MOS transistor (11). Each transistor (10 or 11) has a substrate (12). Bipolar transistor (10) has a first current electrode (26) underlying a control electrode (28), and a second current electrode (32) overlying the control electrode (28). MOS transistor (11) has a first current electrode (54) underlying a channel region (56), and a source lightly doped region (58) and a source heavily doped region (60) overlying the channel region (56). A control electrode conductive layer (40) is laterally adjacent a sidewall dielectric layer (48), and sidewall dielectric layer (48) is laterally adjacent channel region (56). Conductive layer (40) functions as a gate electrode for transistor (11). Each of the transistors (10 and 11) is vertically integrated such as in a vertically integrated BiMOS circuit. Transistors (10 and 11) can be electrically isolated by isolation ( 64 and 66).

Method for forming vertical transistor structures having bipolar and MOS

Method for forming a transistor having a dynamic connection between a

Method of formation of vertical transistor

A field effect transistor, FET, (11) having a gate dielectric of varying thickness (14, 24) to improve device performance. The FET (11) is made on a substrate (10) and has a control electrode, or gate (16), and two current electrodes, or source and drain regions (28), which are separated by a channel region. The gate (16) is separated from the channel region by a gate dielectric. The gate dielectric has a centrally located first region that is of a first thickness (14) and a second region which is adjacent a perimeter of the first region that is of a second thickness (24). The second thickness (24) is made greater than the first thickness (14).

Field effect transistor having a gate dielectric with variable thickness

A transistor (10) has a substrate (12) and a diffusion (14). A gate conductive layer (18) overlies the substrate (12) and has a sidewall formed by an opening that exposes the substrate (12). A sidewall dielectric layer (22) formed laterally adjacent the conductive layer (18) sidewall functions as a gate dielectric for the transistor (10). A conductive region is formed within the opening. The conductive region has a first current electrode region (28) and a second control electrode region (34) and a channel region (30) laterally adjacent the sidewall dielectric layer (22). A plurality of transistors, each in accordance with transistor (10), can be stacked in a vertical manner to form logic gates such as NMOS or PMOS NAND, NOR, and inverter gates, and/or CMOS NAND, NOR, and inverter gates with multiple inputs.

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Austin, TX, United States of America

Carlos A Mazure