International Business Machines Corporation

Carlos A Fonseca

Lars W Liebmann

Ioana C Graur

Abhishek Malvankar

John Michael Ganci, Jr

Charles Evan Beller

Benjamin L Fletcher

Eric James Barkie

Colm V Malone

Leslie S Liu

Min Wei

Mark Alan Lavin

Scott Josef Bukofsky

Young O Kim

James Edward Bostick

Craig M Trim

Shikhar Kwatra

Kafai Lai

Michael Straight Hibbs

Allen H Gabor

Naga A Ayachitula

Martin Burkhardt

Sara Rosenthal

Ronald L Gordon

An artificial intelligence (AI) platform to support selective replacement of one or more image layers of a container image build. A metadata file is subject to natural language processing and one or more corresponding vector representations are created and subject to evaluation by a set of artificial neural networks (ANNs). A first ANN assesses each vector representation with respect to compliance and operability, and the second ANN selectively assesses the vector representation(s) with respect to similarity with one or more compliant vector representations. In response to the assignment of the second score, at least one vector representation of the received metadata file is selectively replaced with at least one compliant vector representation. The metadata file is selectively provisioned with the selectively replaced vector representation(s).

Risk assessment of a container build

An artificial intelligence (AI) platform to support optimization of container builds and virtual machine mounts in a distributed computing environment. A provisioning file is subject to natural language processing (NLP) and a corresponding vector representation of the file is created and subject to evaluation by a set of artificial neural networks (ANN). A first ANN assesses the representation of the file with respect to compliance and operability, and the second ANN selectively assesses the representation of the file with respect to provisioning efficiency. The provisioning file is selectively process based on the provisioning efficiency, with the processing directed at provisioning a container build or mounting a VM.

Embodiments are provided for intelligent recommendations for program code. In some embodiments, a system can include a processor that executes computer-executable components stored in memory. The computer-executable components can include an evaluation component that determines that first program code pertains to a defined category representing a defined cost to execute the first program code by a cloud computing service. The computer-executable components also can include a recommendation component that generates a recommendation for second program code that satisfies a similarity criterion with respect to the first program code. The second program code pertains to a category representing a cost to execute the second program code by the cloud computing service, where the cost is less than the defined cost.

Intelligent recommendations for program code

The present invention may include an embodiment that receives a deployment declaration in a natural language. The embodiment may detect one or more sequencing entities and one or more parameter entities using trained natural language processing. The embodiment may sequence a configuration file based on the one or more sequencing entities. The embodiment may determine a plurality of configuration parameters in the sequenced configuration file. The embodiment may substitute a configuration parameter from the plurality of configuration parameters of the sequenced configuration file with the one or more parameter entities. The embodiment may align the plurality of configuration parameters of the sequenced configuration file based on organization compliance data and deploys a tuned cloud service using the sequenced configuration file.

Generation of adaptive configuration files to satisfy compliance

Methods and systems for phonological clustering are disclosed. A method includes: segmenting, by a computing device, a sentence into a plurality of tokens; determining, by the computing device, a plurality of phoneme variants corresponding to the plurality of tokens; clustering, by the computing device, the plurality of phoneme variants; creating, by the computing device, an initial vectorization of the plurality of phoneme variants based on the clustering; embedding, by the computing device, the initial vectorization of the plurality of phoneme variants into a deep learning model; and determining, by the computing device, a radial set of phoneme variants using the deep learning model.

Phonological clustering

Techniques are provided for pushing secure notifications to a mobile computing device. For example, a method for pushing secure notifications includes a push service platform receiving a push notification message request from an entity registered with the push service platform, processing the push notification message request to generate a secure push notification message, and sending the secure push notification message to a target mobile computing device through a native third-party push service associated with the target mobile computing device. The secure push notification message includes a message ID (identifier) that corresponds to message content associated with the push notification message request. The method further includes the push service platform receiving a pull message request from the target mobile computing device, the pull message request requesting the message content associated with the push notification message corresponding to the message ID, and sending the requested message content associated with the push notification message to the mobile computing device.

Pushing secure notifications to mobile computing devices

A method for pushing secure notifications includes a push service platform receiving a push notification message request from an entity registered with the push service platform, processing the push notification message request to generate a secure push notification message, and sending the secure push notification message to a target mobile computing device through a native third-party push service associated with the target mobile computing device. The secure push notification message includes a message ID (identifier) that corresponds to message content associated with the push notification message request. The method further includes the push service platform receiving a pull message request from the target mobile computing device, the pull message request requesting the message content associated with the push notification message corresponding to the message ID, and sending the requested message content associated with the push notification message to the mobile computing device.

A method of designing an alternating phase shifting mask for projecting an image of an integrated circuit design having a plurality of spaced segments of critical dimension. The method initially identifies a phase universe boundary, such that the phase universe comprises a contiguous region of the integrated circuit layout wherein critical dimension segments within the phase universe are beyond a maximum phase interaction distance from any critical dimension segments outside the phase universe in accordance with predetermined design rules. The method then divides the phase universe into phase regions separated by the integrated circuit layout and any extensions of the critical dimension segments so that the phase regions are binary colorable within the phase universe.

Method for designing alternating phase shift masks

A method of designing a mask for imaging an integrated circuit (IC) design layout is provided to efficiently configure subresolution assist features (SRAFs) corresponding to an optimally configured annular illumination source of a lithographic projection system. A critical pitch is identified for the IC design, and optimal inner and outer radial coordinates of an annular illumination source are determined so that the resulting image projected through the mask will be optimized for the full range of pitches in the design layout. A relationship is provided for determining an optimal inner radius and outer radius for the annular illumination source. The number and placement of SRAFs are added to the mask design so that the resulting range of pitches substantially correspond to the critical pitch. The method of configuring SRAFs so that the image will have optimal characteristics, such as good contrast and good depth of focus, is fast.

Pitch-based subresolution assist feature design

A method is described for designing an alternating phase shifted mask (altPSM) by optimally selecting the width of phase shapes. The selection of optimal phase shape widths is achieved by providing a lithography metric that describes the relationship between phase shape width and the target image dimension such that the metric, such as process window or across chip linewidth variation (ACLV), is optimized. In a preferred embodiment, ACLV is computed by Monte Carlo simulation by providing a set of error distributions for lithographic parameters such as focus, dose, lens aberrations, and the like. Alternatively, a lookup table of optimal phase widths associated with target image dimensions may be provided. The resulting altPSM is characterized by phase shapes having widths that vary according to the widths of the target image dimensions.

Alternating phase shift mask design with optimized phase shapes

A method is provided for designing an altPSM mask including a substrate. The method includes the following steps. Provide a circuit layout. Identify critical elements of the circuit layout. Provide a cutoff layout dimension. Identify critical segments of the circuit layout which are critical elements with a sub-cutoff dimension less than the cutoff dimension. Create basic phase shapes associated with the critical segments. Remove layout violations from the phase shapes. Determine whether the widths of phase shapes associated with a critical segment have unequal narrower and wider widths. If YES, then widen each narrower phase shape to match the width of wider phase shape associated with the critical segment and repeat the steps starting with removal of layout violations until the test answer is NO. When the test answer is NO, provide a layout pattern to an output.

Phase-width balanced alternating phase shift mask design

A method and apparatus for making phase shift masks are provided wherein an anti-reflective coating used on an opaque pattern layer of the mask fully covers the opaque pattern layer and has not been etched in the etching process to form the phase shift mask. A two-exposure method to form the phase shift mask is used wherein a photoresist having a defined dose-to-clear level is coated on the surface of the mask and the lower surface of the mask is exposed to a blanket exposure in an energy amount less than the dose-to-clear level. The open areas of the upper surface of the mask to be etched are exposed to an energy dose in an amount less than the dose-to-clear level, with the sum of the amounts of the lower surface energy and upper surface energy being at least the dose-to-clear level. The method and apparatus minimizes and/or avoids etching of the anti-reflective coating.

Self-aligned alternating phase shift mask patterning process

A method and computer program product is described for optimizing the design of a circuit layout that assigns binary properties to the design elements according to a hierarchy of rules. For example, the design of an alternating phase shifted mask (altPSM) is optimized first according to rules that assign phase shapes that maximize image quality for critical circuit elements, and then further optimized to minimize mask manufacturability problems without significantly increasing the complexity of the design process flow. Further optimization of the design according to additional rules can be performed in a sequentially decreasing priority order. As the priority of rules decrease, some violation of lower priority rules may be acceptable, as long as higher priority rules are not violated.

Priority coloring for VLSI designs

A method of evaluating process effects of multiple exposure photolithographic processes by first determining a set of expected images for each exposure step or process of the multiple exposure process individually and then obtaining a composite set of images by sequentially perturbing images from a first or previous exposure step by weighted images from the subsequent exposure step. Preferably, the expected images are determined by simulation in the form of normalized aerial images over a range of defocus for each exposure step, and the weighting factor used is the dose-ratio of the subsequent exposure dose to the prior step exposure dose. The resulting composite set of images may be used to evaluate multiple exposure processes, for example, to provide an estimate of yield for a given budget of dose and focus errors, or alternatively, to provide specifications for tool error budgets required to obtain a target yield.

Growing community of inventors

Staten Island, NY, United States of America

Carlos A Fonseca