Asml Netherlands B.v.

Carlo Lancia

Alexander Ypma

Seyed Iman Mossavat

Dimitra Gkorou

Juan Manuel Gonzalez Huesca

Reza Sahraeian

Dirk-Jan Kernkamp

Eleftherios Koulierakis

Anjan Prasad Gantapara

A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

Methods of modelling systems for performing predictive maintenance of systems, such as lithographic systems

A method for determining an inspection strategy for at least one substrate, the method including: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre-processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for the at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.

Method for determining an inspection strategy for a group of substrates in a semiconductor manufacturing process

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Eindhoven, Netherlands

Carlo Lancia