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Politecnico Di Milano

Universitá Degli Studi Di Milano-Bicocca

Carlo Enrico Bottani

Claudia Riccardi

Fabio Di Fonzo

Moreno Piselli

Matteo Paolo Bogana

Francesco Sirio Fumagalli

Anna Facibeni

David Dellasega

A method for producing, by means of plasma, nanostructured thin layers particularly of the hierarchically organized type, and an apparatus for implementing the method, are described. At least a first chamber () is provide in which are present an injector () of a reagent gas, means (') for feeding inert gases, and an antenna () for the creation of a plasma in said first chamber. Enclosing said first chamber is a second chamber () to which a pumping system is connected, containing a housing for the substrate () on which the nanostructured film is produced. A wall () separates said first chamber from said second chamber and has at least one opening (). The injector and antenna are arranged in the first chamber with a geometry such that the distance between the outlet of said injector is at a distance of no more than 5 cm from the plane of the surface of said antenna farther from said wall, and said surface is at a distance of no more than 5 cm from said opening.

Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure

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Milan, Italy

Carlo Enrico Bottani