Asm IP Holding B.v.

Asm America, Inc.

Applied Materials, Inc.

Materials Research Corporation

Heliae Development, LLC

Asm IP Holdings B.v.

Sony Corporation

Tokyo Electron Limited

Carl Louis White

Eric James Shero

Kyle Fondurulia

Mohith E Verghese

Todd Robert Dunn

Herbert Terhorst

David Marquardt

Jereld Lee Winkler

John Kevin Shugrue

Bhushan Zope

Mike Halpin

Jerry Winkler

Michael W Halpin

Timothy James Sullivan

Dinkar Nandwana

Robert F Foster

Shankar Swaminathan

Rene E LeBlanc

Rikhit Arora

Marko Peussa

Helen E Rebenne

Darko Babic

Sokol Ibrani

Fred Pettinger

Min Yan

Dave Marquardt

Dan Maurice

Joseph T Hillman

Fred Alokozai

Jason D Licamele

Jon R MacErnie

Jose Alexandro Romero

William George Petro

Raj Singu

Lucian C Jdira

Andrew M Yednak, Iii

Ankit Kimtee

Melvin Verbaas

Michael Schmotzer

Paul G Curry

Michael Lee Manasco

Mark Olstad

Christopher Wuester

Govindarajasekhar Singu

Melvin Verbass

Aniket Chitale

Gnyanesh Trivedi

Joe Reed

A semiconductor processing device is disclosed. The device can include a reactor and a solid source vessel configured to supply a vaporized solid reactant to the reactor. A process control chamber can be disposed between the solid source vessel and the reactor. The device can include a valve upstream of the process control chamber. A control system can be configured to control operation of the valve based at least in part on feedback of measured pressure in the process control chamber.

Semiconductor processing device

The present disclosure pertains to embodiments of a showerhead assembly which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The showerhead assembly has a showerhead which has an increased thickness which advantageously decreases reactor chamber size and decreases cycling time. Decreased cycling time can improve throughput and decrease costs.

Showerhead assembly and components

Showerhead assemblies, gas distribution plates, and systems including the same are disclosed. Exemplary showerhead assemblies include a gas distribution plate. Exemplary gas distribution plates include apertures designed to direct a flow of gas and to reduce stagnation of gas on surfaces of the plates.

Showerhead assembly and components thereof

A workpiece susceptor body can include a front face configured to support a workpiece, a back face opposite the front face, a workpiece contact zone at least partially forming a support boundary on an inner portion of the front face, and a plurality of axial channels disposed within the susceptor body. The workpiece contact zone can be disposed radially inward of an outer edge of a workpiece positioned on the front face in a processing configuration. Each of the plurality of axial channels may connect to corresponding openings extending into an outer portion of the front face. Each of the openings may be disposed radially outward of the workpiece contact zone of the susceptor body.

Substrate susceptor using edge purging

Embodiments of a solid chemical delivery system having a refillable sublimation vessel are provided herein. In some embodiments, a solid chemical delivery system includes: a refillable sublimation vessel including: a vessel body coupled to a vessel lid to define an interior volume of the refillable sublimation vessel, wherein the vessel lid includes a central refill port, a gas inlet port, and a gas outlet port; a flow restricting structure disposed in an upper portion of the interior volume; and a vertical appendage disposed in the interior volume and extending from a bottom plate of the vessel body; a refill cartridge removably coupled to the central refill port of the refillable sublimation vessel and having an internal volume therein; and a first valve disposed between the refillable sublimation vessel and the refill cartridge.

Refillable large volume solid precursor sublimation vessel

A showerhead assembly for distributing a gas within a reaction chamber is disclosed. The showerhead assembly may comprise: a chamber formed within the showerhead assembly and a gas distribution assembly adjacent to the chamber, wherein the gas distribution assembly comprises: a first gas distribution plate comprising a top surface and a bottom surface; and a second gas distribution plate comprising a top surface and a bottom surface, the second gas distribution plate being disposed over the top surface of the first gas distribution plate. The gas distribution assembly may further comprise: one or more heating structures disposed between the first gas distribution plate and the second gas distribution plate; and a plurality of apertures extending from the bottom surface of the first distribution plate to the top surface of the second gas distribution plate. Methods for controlling the temperature uniformity of a showerhead assembly utilized for distribution gas with a reaction chamber are also disclosed.

Showerhead assembly for distributing a gas within a reaction chamber

A cooling apparatus and methods for maintaining a precursor source vessel heater at a desired temperature are disclosed. The apparatus and methods can be used to maintain a desired temperature gradient within the precursor source vessel for improved integrity of the precursor source before delivery of the precursor to a reaction chamber. The apparatus and methods can also be used for rapid cooling of a source vessel for maintenance.

Heater assembly including cooling apparatus and method of using same

A temperature control system for a chemical delivery system (e.g., comprised in a reactor system) may comprise a temperature control shell coupled to and/or enclosing at least a portion of at least one component of the chemical delivery system. A chemical delivery system may comprise a filter, an accumulator, and/or a chemical application line fluidly coupled to one another in any suitable arrangement and/or configuration. A temperature control system for such a chemical delivery system may comprise a filter temperature control shell coupled to and/or enclosing at least a portion of the filter, an accumulator temperature control shell coupled to and/or enclosing at least a portion of the accumulator, and/or an application line temperature control shell coupled to and/or enclosing at least a portion of the chemical application line.

Temperature-controlled chemical delivery system and reactor system including same

Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port an outlet port, a manifold having a serpentine base creating a tortuous flow path and a filter media assembly in a bottom-fed configuration. The torturous flow path is defined by a plurality of elongate walls and a plurality of openings of the serpentine base ampoule, through which a carrier gas flows in contact with the precursor.

Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

A reactor system may comprise a reaction chamber enclosed by a chamber sidewall, and a susceptor disposed in the reaction chamber between a reaction space and a lower chamber space comprised in the reaction chamber. The susceptor may comprise a pin hole disposed through the susceptor such that the pin hole is in fluid communication with the reaction space and the lower chamber space, and such that the reaction space is in fluid communication with the lower chamber space. A lift pin may be disposed in the pin hole. The lift pin may comprise a pin body comprising a pin channel, defined by a pin channel surface, disposed in the pin body such that the reaction space is in fluid communication with the lower chamber space when the lift pin is disposed in the pin hole.

Channeled lift pin

An apparatus and method are disclosed for monitoring and/or detecting concentrations of a chemical precursor in a reaction chamber. The apparatus and method have an advantage of operating in a high temperature environment. An optical emissions spectrometer (OES) is coupled to a gas source, such as a solid source vessel, in order to monitor or detect an output of the chemical precursor to the reaction chamber. Alternatively, a small sample of precursor can be periodically monitored flowing into the OES and into a vacuum pump, thus bypassing the reaction chamber.

Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment

Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

Reactant vaporizer and related systems and methods

Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and an ingress openings of the ampoule, through which a carrier gas flows in contact with the precursor.

Ampoule for a semiconductor manufacturing precursor

The present disclosure pertains to embodiments of a semiconductor deposition reactor manifold and methods of using the semiconductor deposition reactor manifold which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The semiconductor deposition reactor manifold has a bore, a first supply channel, and a second supply channel. Advantageously, the first supply channel and the second supply channel merge with the bore in an offset fashion which leads to reduced cross-contamination within the supply channels.

Semiconductor deposition reactor manifolds

Growing community of inventors

Gilbert, AZ, United States of America

Carl Louis White