International Business Machines Corporation

Nikon Corporation

Carl Emil Bohnenkamp

Michael S Gordon

Rodney A Kendall

Steven D Golladay

Kenneth Parker Rodbell

Ethan Harrison Cannon

Chester T Dziobkowski

Theodore Harold Zabel

Ethan W Cascio

A method of producing an ion beam in a tandem accelerator, the method includes the acts of insulating, in a cavity containing an insulating gas under pressure, a beam tube having first and second ends and a terminal situated between the first and second ends; seating, using a load lock valve, the insulating gas under pressure; generating an operating voltage using a first voltage source situated outside the cavity when the operating voltage is less than or equal to a threshold value; generating the operating voltage using a second voltage source situated inside the cavity when the operating voltage is greater than the threshold value; coupling the terminal to the first or second voltage sources; generating, using a particle source, an ion beam; and accelerating the ion beam in a first and second parts of the beam tube.

Tandem accelerator having low-energy static voltage injection and method of operation thereof

Issues that are addressed in accordance with at least one presently preferred embodiment of the present invention, are: improvements upon the time it takes to physically swap degraders (done previously by hand); the safety involved in doing so, since the degraders become highly radioactive; possible improved energy resolution and beam stability if the accelerator can be left running continuously; and in-situ monitoring of beam current, beam position and stability. Particularly contemplated are methods and arrangements for changing degraders automatically, not manually, and in a safe manner.

Automatic exchange of degraders in accelerated testing of computer chips

An instrument for measurement of illumination intensity distribution of an Electron Beam Projection System (EBPS) comprises a reticle with a clear subfield, a pinhole plate comprising a block of a low atomic number material with a high aspect ratio pinhole therethrough, the pinhole plate being positioned at the image plane of the EBPS. Means is provided for detecting electrons passing through the pinhole, and means is provided for moving, scanning, the pinhole with respect to a fixed electron intensity distribution or scanning the electron intensity distribution with respect to pinhole when held in a fixed position.

Pinhole detector for electron intensity distribution

Direct and indirect electron bombardment provide a sufficiently high degree of temperature uniformity across the emitting surface of a large-area electron source for an electron beam projection system such that a broad beam having illumination uniformity within 1% can be achieved. A diode gun is used to obtain extraction field uniformity and maintain uniformity of illumination. Power requirements and power dissipation in beam periphery truncating apertures is reduced by roughening the surface of a monocrystalline cathode or depositing materials having a higher work function thereon.

High emittance electron source having high illumination uniformity

A charged particle beam apparatus having a cold trap positioned in proximity to components, such as a shaping aperture and a backscattered electrons detector, to which contaminants tend to migrate to adversely affect the functions of these components. As a coolant is passed through the cold trap, the contaminants condense on the cold trap and away from the shaping aperture and the backscattered electrons detector.

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Hopewell Junction, NY, United States of America

Carl Emil Bohnenkamp