Polaroid Corporation

3m Innovative Properties Company

Polaroid Corporation, Patent Dept.

Carl A Chiulli

William T Plummer

Christopher R Needham

Stephen F Clark

Yalan Mao

Pradnya V Nagarkar

Jyothsna Ram

Linda S Heath

James T Richard

Radha Sen

Harris R Miller

John E MacLatchy

David W McCarthy

An ablatable laminar imaging medium useful in the manufacture of a substantially transparent electrode assembly is disclosed. The laminar imaging medium comprises a substrate, a high-index metal oxide layer, an ablatable metallic conductive layer, a high-index conductive metal oxide layer, and an ablation enhancement layer. The ablation enhancement layer has an IR-absorption greater than the IR-absorption of said high-index conductive metal oxide layer and an IR-reflectivity less than the IR-reflectivity of said high-index conductive metal oxide layer. Presence in the laminar imaging medium of the ablation enhancement layer lowers the exposure threshold of the medium and improves ablation accuracy, both&mdash;when occasioned in the manufacture of LCD electrode patterns&mdash;resulting collectively and ultimately in a more reliably formed electrical architecture, less susceptible to unwanted &ldquo;shorting&rdquo;.

Ablation enhancement layer

Apparatus and methods for exposing multilayered thermal imaging media to eliminate 'cloud' or 'woodgrain' artifacts by proper optimization of the exposing radiation angle of incidence. The exposure angle of incidence is large enough so that all rays with high reflectance loss are paired with equally many with low reflectance loss to increase printing efficiency.

Apparatus and method for enhancing printing efficiency to reduce

A substrate (typically a solid state imager or a liquid crystal display device) is provided with a filter by forming a layer of photoresist on the substrate, and exposing and developing the photoresist to produce filter elements from the portions of the layer of photoresist remaining after the development. After development of the layer of photoresist, the substrate is treated with a silylation compound capable of cross-linking the photoresist and of promoting adhesion of the photoresist to the substrate. A preferred silylation compound is hexamethylcyclotrisilizane.

Process for preparing a color filter

Apparatus and methods for exposing multilayered thermal imaging by proper optimization of the exposing radiation angle of incidence of a coherent radiation source to eliminate 'cloud' or 'woodgrain' artifacts stemming from local differences in printing efficiency across a sheet of the multilayered imaging media. A media is mounted to an exposure surface and exposed with a scanning coherent Gaussian laser beam at an angle other than normal incidence. The angle of incidence of the exposing beam is intentionally made large enough so that all rays with high reflectance loss are paired with equally many with low reflectance loss to increase printing efficiency. This efficiency occurs over a range of angles between 21 and 25 degrees, with some benefit beginning at 16 degrees.

A filter is formed on a solid state imager by:

Process for forming a filter on a solid state imager

A filter is formed on a substrate, such as a solid state imager, by providing successively on the substrate a layer of an absorber material, a layer of a barrier material, and a layer of a photoresist material. The photoresist is patternwise exposed and developed, thereby baring regions of the barrier layer underlying selected regions of the photoresist layer. The coated substrate is reactive ion etched under a first set of etching conditions to etch away the bared regions of the barrier layer and to bare but not substantially etch the underlying regions of the absorber layer, and then reactive ion etched under a second set of etching conditions, thereby etching away the remaining regions of the photoresist layer and the bared regions of the absorber layer, so forming a filter on the substrate. To form multi-colored filters, the process may be repeated with a different dye, or additional dyes may be deposited by other processes, such as that described in U.S. Pat. No. 4,808,501.

Filter and solid state imager incorporating this filter

The electromagnetic radiation output from a solid-state radiation emitter is adjusted by covering at least part of the emission surface with an absorber material which absorbs the radiation emitted from the emitter, and directing a beam of radiation from outside the radiation emitter on to the absorber material so as to ablate at least part of the absorber material from the emission surface, or render at least part of the absorber material transmissive of the electromagnetic radiation from the emitter. The process is especially useful for equalizing the outputs from an array of emitters, such as a bar of light emitting diodes.

Process to adjust output of light emitters

Process for forming a color filter

A color filter is formed on a support, such as a charge coupled device, by (a) forming a layer on a support with a composition comprising a positive photoresist and a dye; said dye being soluble in the solvent of said photoresist; (b) exposing predetermined portions of said layer to radiation adapted to increase the solubility of said coating in the exposed areas; (c) developing said exposed areas to form a pattern of filter elements; and (d) repeating said steps with a different color dye in said composition; wherein said dye constitutes in excess of 10% by weight, dry basis of said composition, is substantially non-absorptive in the exposure wavelength of said composition, and provides predetermined absorptive characteristics for the specified filter element and said dye possessing substantially the same polarity as said composition.

Method for manufacturing an optical filter

A surface-type microporous filter is prepared by embossing substantially uniform holes in an embossable polymer carried on a porous support wherein the pores are filled with a soluble filler. Subsequent to the embossing step, the filler is removed by dissolution.

Growing community of inventors

Randolph, MA, United States of America

Carl A Chiulli