Lam Research Corporation

Candi Kristoffersen

Richard Howard Gould

Andrew D Bailey, Iii

Benjamin W Mooring

Thorsten B Lill

Meihua Shen

Vahid Vahedi

Richard M Blank

Gary Bultman

Christopher William Burkhart

James S Van Gogh

Derek Witkowicki

Brandon L Senn

Michael Nordin

Scott Vernon Wong

Gustavo G Francken

Silvia Aguilar

Hironobu Yasuumi

Rangesh Raghavan

Michael Leonard

A system comprises an equipment front end module (EFEM), a vacuum transfer module (VTM), a plurality off quad station process modules (QSMs). The EFEM is configured to receive a plurality of wafers. The EFEM comprises an EFEM transfer robot. The vacuum transfer module (VTM) is configured to receive the plurality of wafers from the EFEM. The VTM comprises a VTM transfer robot. The plurality of quad station process modules (QSMs) is coupled to the VTM. The VTM transfer robot is configured Oto transfer wafers between the VTM and the plurality of QSMs. The EFEM transfer robot is configured to transfer wafers between the EFEM and the VTM.

Reduced footprint wafer handling platform

A loading station for a substrate processing system includes first and second vertically-stacked loading stations. The first loading station includes a first airlock volume and first and second valves arranged at respective ends of the first loading station. The first and second valves are configured to selectively provide access to the first airlock volume and include first and second actuators, respectively, configured to open and close the first and second valves, and the first and second actuators extend downward from the first loading station. The second loading station includes a second airlock volume and third and fourth valves arranged at respective ends of the second loading station. The third and fourth valves are configured to selectively provide access to the second airlock volume and include third and fourth actuators, respectively, configured to open and close the third and fourth valves.

Platform architecture to improve system productivity

An EFEM useful for transferring wafers to and from wafer processing modules comprises an enclosure having a controlled environment therein bounded by a front wall, a back wall, first and second side walls, a top wall, and a bottom wall. The first side wall and the second side wall include two or more wafer load ports wherein each wafer load port is adapted to receive a FOUP. The front wall includes wafer ports configured to attach to respective load locks operable to allow a wafer to be transferred to a front wall cluster processing tool. The back wall includes a wafer port adapted to be in operational relationship with a back wall cluster processing tool. A robot in the EFEM enclosure is operable to transfer wafers through the wafer load ports, the first front wall wafer port, the second front wall wafer port, and the back wall wafer port.

Equipment front end module for transferring wafers and method of transferring wafers

A substrate cassette loading system for docking substrate cassettes to a substrate processing system is provided. A plurality of ports passes substrates into the substrate processing system, wherein a first port of the plurality of ports is vertically above a second port of the plurality of ports. A plurality of cassette loaders provides substrate cassettes to the plurality of ports.

Stacked wafer cassette loading system

A method of determining an average electrical response to a conductive layer on a set of substrates vibrating about a vibration mean is disclosed. The method includes positioning a sensor near a position on a first substrate; and measuring a first plurality of electrical responses, wherein each of the first plurality of electrical responses is function of an electrical film property response and a first substrate proximity response. The method also includes positioning the sensor near the position on a second substrate; and measuring a second plurality of electrical responses, wherein each of the second plurality of electrical responses is function of the electrical film property response and a second substrate proximity response. The method further includes determining a first average electrical response for the first substrate and a second average electrical response for the second substrate, wherein a difference between an average first substrate proximity response and an average second substrate proximity response is about zero.

Methods and apparatus for determining an average electrical response to a conductive layer on a substrate

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San Jose, CA, United States of America

Candi Kristoffersen