Micron Technology Incorporated

Caizhi Xu

Yongjun Jeff Hu

Jaydeb Goswami

Yiping Wang

Russell A Benson

Pengyuan Zheng

Ying Rui

Systems, apparatuses, and methods related to atom implantation for reduction of compressive stress are described. An example method may include patterning a working surface of a semiconductor, the working surface having a hard mask material formed over a dielectric material and forming a material having a lower refractive index (RI), relative to a RI of the hard mask material, over the hard mask material. The method may further include implanting atoms through the lower RI material and into the hard mask material to reduce the compressive stress in the hard mask material.

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Boise, ID, United States of America

Caizhi Xu