United Microelectronics Corp.

C M Chi

Chia-Fu Yeh

W H Cheng

Yu-Chang Chow

Cobby Lee

A process for cleaning the interior walls of a reaction chamber after a number of silicon wafers is etched inside the chamber. The cleaning process includes bombarding the interior walls of the chamber with a first type of plasma in a dry cleaning operation, and then bombarding the interior walls of the chamber with a second type of plasma containing the element hydrogen in a warm-up operation. No silicon wafers need to be placed inside the chamber when the dry cleaning operation or the warm-up operation is conducted.

Growing community of inventors

Taichung Hsien, Taiwan

C M Chi