University of Texas System

Molecular Imprints, Inc.

Canon Nanotechnologies, Inc.

Intellectual Ventures Holding 40 LLC

C Grant Willson

Christopher John Ellison

Christopher M Bates

Byung Jin Choi

Timothy B Michaelson

Jason E Meiring

Matthew Earl Colburn

Todd Christopher Bailey

John G Ekerdt

Tsuyoshi Ogawa

Sidlgata V Sreenivasan

Julia Cushen

S V Sreenivasan

Logan J Santos

Leon Dean

Erica L Rausch

Michael Maher

Dustin Janes

Michael B Jacobsson

Mario Johannes Meissl

Yukio Nishimura

Michael P C Watts

Ronald D Voisin

Nicholas A Stacey

Norman E Schumaker

Stephen C Johnson

Roger Bonnecaze

Takehiro Seshimo

B Michael Jacobsson

William J Durand

Uzodinma Okoroanyanwu

David Medieros

Timo Rager

Shintaro Yamada

Michael D Stewart

Frank Palmieri

Jeffrey Strahan

Takehiro Sleshimo

Michael PC Watts

John Ekerdt

John Eckerdt

Todd Bailley

V Screenivasans S

The concepts described herein involve the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

Anhydride copolymer top coats for orientation control of thin film block copolymers

A method for ordering block copolymers including forming a first layer having a first preference mode; and providing a reactive agent in selected regions of the first layer that modifies the selected regions to a second preference mode, wherein the selected regions define other regions of the first layer retaining the first preference mode thereby forming an alignment layer for block copolymers.

Ordering block copolymers

The present invention describes branched and functionalized siloxanes and methods for making such compounds. The compounds have a variety of uses. One preferred application is as novel planarizing material for lithogaphy, in which case functionalized branched siloxane, such as an epoxy-modified branched siloxane is particularly useful.

Branched siloxanes and methods for synthesis

The present invention describes branched and functionalized siloxanes and methods for making such compounds. The compounds have a variety of uses. One preferred application is as novel planarizing material for lithography, in which case functionalized branched siloxane, such as an epoxy-modified branched siloxane is particularly useful.

A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.

Image and part recognition technology

The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical features of a block copolymer deposited over the first copolymer. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

Surface treatments for alignment of block copolymers

Vacuum deposited thin films of material are described to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Using chemical vapor deposited films to control domain orientation in block copolymer thin films

Densely packed sensor arrays

In some embodiments, the present invention is directed to methods that involve the combination of step-and-flash imprint lithography (SFIL) with a multi-tier template to simultaneously pattern multiple levels of, for example, an integrated circuit device. In such embodiments, the imprinted material generally does not serve or act as a simple etch mask or photoresist, but rather serves as the insulation between levels and lines, i.e., as a functional dielectric material. After imprinting and a multiple step curing process, the imprinted pattern is filled with metal, as in dual damascene processing. Typically, the two printed levels will comprise a 'via level,' which is used to make electrical contact with the previously patterned under-level, and a 'wiring level.' The present invention provides for the direct patterning of functional materials, which represents a significant departure from the traditional approach to microelectronics manufacturing.

Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing

A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.

Compositions for dark-field polymerization and method of using the same for imprint lithography processes

The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location.

Method of creating a dispersion of a liquid on a substrate

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Austin, TX, United States of America

C Grant Willson