Samsung Electronics Co., Ltd.

Byunghun Han

Seungbo Shim

Dougyong Sung

Minjae Lee

Yonghee Kim

Donghyeon Na

Myungsun Choi

Minyoung Hur

Hyeongmo Kang

Sungjin Park

Jungmoon Kim

Insuk Kim

Seunggun Ham

A plasma etching method and a semiconductor device fabrication method, the plasma etching method including providing a source power having a first single pulse to an electrostatic chuck in order to generate a plasma on a substrate; providing a first bias power having a burst pulse different from the first single pulse to concentrate the plasma on the substrate; and providing a second bias power having a second single pulse the same as the first single pulse to accelerate the plasma toward the substrate.

Plasma etching method and semiconductor device fabrication method including the same

An OLED display system includes a display panel, a driving circuit, a voltage generator and a power management application circuit (PMAC). The driving circuit provides scan signals to the display panel. The voltage generator generates a negative voltage based on a first driving voltage having a positive level and a second driving voltage having a negative level and provides the negative voltage to the driving circuit. The PMAC includes a power management application circuit (PMIC) and an additional circuit distinct from the PMIC and disposed externally to the PMIC. The PMIC applies a high power supply voltage and a low power supply voltage to the display panel and generates the first driving voltage based on a battery voltage. The additional circuit generates the second driving voltage based on the battery voltage. The driving circuit generates at least one of the scan signals based on the negative voltage.

Organic light emitting diode display system

Growing community of inventors

Suwon-si, South Korea

Byunghun Han