Skhynix Inc.

Byung Hyun Jeon

Sung Lae Oh

Sang Hyun Sung

Young Ki Kim

Yong Kim

Hyun Soo Lee

Jin Ho Kim

Sun Young Jung

A memory device includes a first semiconductor structure including pass transistors defined in a row decoder region of a substrate, a first bonding layer including first bonding pads, and bottom wiring layers disposed between the substrate and the first bonding layer; a second semiconductor structure including a second bonding layer including second bonding pads bonded to the first bonding pads, a memory cell array, and a top wiring layer disposed between the second bonding layer and the memory cell array; and global lines disposed in the row decoder region, and configured to transfer operating voltages to the pass transistors, wherein the bottom wiring layers include bottom wiring layers of a first tier and bottom wiring layers of a second tier disposed over the bottom wiring layers of the first tier, and the global lines are disposed in at least one of the bottom wiring layers of the first tier.

Memory device including row decoder

A memory device includes a substrate defined with a first cell region and a second cell region, and a row decoder region between the first and second cell regions; a peripheral circuit defined in the first and second cell regions of the substrate; pass transistors defined in the row decoder region of the substrate; bottom wiring layers disposed in a first dielectric layer covering the peripheral circuit and the pass transistors; a memory cell array defined on the first dielectric layer; a second dielectric layer defined on the first dielectric layer, and covering the memory cell array; top wiring layers disposed in a third dielectric layer defined on the second dielectric layer; and global lines disposed in the row decoder region, and configured to transfer operating voltages to the pass transistors, wherein the global lines are disposed only in at least one bottom wiring layer from among the bottom and top wiring layers.

A memory device includes an open-for-contact region located between the memory blocks, and a row decoder disposed between global lines to which an operating voltage is supplied and the local lines and configured to transfer the operating voltage to one memory block among the memory blocks in response to a row address, wherein a plurality of contacts are formed in the open-for-contact region and configured to transmit a voltage between the bit lines and a peripheral circuit, wherein a dummy region is included in the row decoder and disposed paced apart from the open-for-contact region in the second direction, and wherein a discharge switch is included in the dummy region and configured to discharge the global lines in response to a discharge signal.

Memory device

A semiconductor memory device includes a substrate having a second region extending in a first direction; a memory block including electrodes; a slit dividing the memory block into first and second electrode structures in the second region; and step-shaped grooves formed in the memory block in the second region, and divided by the slit. In the second region, the first and second electrode structures are adjacently disposed with the slit interposed therebetween, in a second direction intersecting with the first direction. Each of the electrodes of the first electrode structure has a first pad region, each of the electrodes of the second electrode structure has a second pad region, and first and second pad regions of the first and second electrode structures which are positioned in the same step-shaped groove and are disposed at the same layers are adjacently disposed in the second direction with the slit interposed therebetween.

Growing community of inventors

Gyeonggi-do, South Korea

Byung Hyun Jeon