Anam Semiconductor Inc.

Byung Chul Lee

An apparatus for removing undesired particles on a target object comprises an electrostatic charge inductor for attracting the undesired particles on the target object, an electrostatic charge developer coming into contact with the electrostatic charge inductor, and a driving source for rotating the electrostatic charge developer. The electrostatic charge developer is rotated by the driving source to be rubbed by the electrostatic charge inductor, which in turn charges the electrostatic charge inductor with negative electricity. The charged inductor attracts the undesired particles off the target object, thereby removing the undesired particles therefrom.

Apparatus for removing contaminant particles on a photomask

A photomask for use in a photolithography technique includes a transparent portion for transmitting light from a light source, an opaque portion coated with an opaque material for interrupting the light from the light source, and a border portion positioned between the transparent and the opaque portions. The border portion includes a number of patterned structures coated with the opaque material and arranged along an edge of the opaque portion, wherein the amount of light passing through the border portion is gradually increased when moving from a first border line between the opaque and the border portions to a second border line between the border and the transparent portions.

Growing community of inventors

Kyungg-do, South Korea

Byung Chul Lee