Samsung Electronics Co., Ltd.

Byoungsup Ahn

Byounghoon Lee

Byunggook Kim

Suyoung Lee

Yongseok Jung

Jumi Bang

Tamamushi Shuichi

Disclosed are methods of forming a pattern and methods of fabricating a semiconductor device. A method of fabricating a semiconductor device may include providing a substrate comprising a resist layer on the substrate and coating a compound on the resist layer to form a charge dissipation layer. The charge dissipation layer may include a conductive polymer and a metal complex.

Methods of forming a pattern and methods of fabricating a semiconductor device

A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.

Systems including a beam projection device providing variable exposure duration resolution

Growing community of inventors

Seongnam-si, South Korea

Byoungsup Ahn