Samsung Display Co., Ltd.

K. C. Tech Co., Ltd.

Ubmaterials Inc.

Byoungkwon Choo

Woojin Cho

Byoungho Cheong

Heesung Yang

Seungbae Kang

Hyunjin Cho

Joowoan Cho

Sanghoon Ahn

Jeongkyun Na

Oleg Prudnikov

Junggun Nam

Seungik Kang

Pungseok Kim

Keunwoo Lee

Seung Hwan Lee

Seunghwan Lee

Joon-Hwa Bae

Joonhwa Bae

Jinhyung Park

A substrate polishing apparatus including a stage configured to load a substrate, the stage having a flat surface, which is parallel to a first direction and a second direction, and on which the substrate is loaded, a pressing unit configured to exert a pressure on the substrate in a third direction, a rotary unit configured to revolve the pressing unit around a central axis parallel to the third direction, when viewed in a plan view, a plurality of polishing pads provided between the pressing unit and the substrate to be in contact with the substrate, and a nozzle part configured to supply a slurry onto the substrate. The polishing pads may be spaced apart from each other in a direction and may have a rectangular shape in the plan view.

Substrate polishing apparatus

The method of manufacturing a display device includes preparing a substrate having a first and second area surrounding a portion of the first area, forming a semiconductor layer in the first area, forming a first insulating layer covering the semiconductor layer, forming a gate electrode layer that at least partially overlaps the semiconductor layer, forming a pad electrode layer in the second area, forming a second insulating layer covering the gate electrode layer, forming contact holes that at least partially expose the semiconductor layer and the gate electrode layer, and forming a conductive layer positioned in the contact holes and including a first and second layer. The forming of the conductive layer includes forming a first layer material and a second layer material, and removing a portion of the first layer material and a portion of the second layer material to expose the second insulating layer.

Method of manufacturing display device comprising selectively removing a conductive layer

An apparatus for manufacturing a display device includes a moving part including a belt that circulates, a roller that circulates the belt, and at least one meandering prevention portion that moves in a first direction parallel to a direction of a rotation shaft of the roller and prevents meandering of the belt, and a polishing head disposed corresponding to the moving part, the polishing head polishing a surface of a base material disposed on a first surface of the belt. A part of the at least one meandering prevention portion faces a second surface of the belt, the second surface being a side surface of the belt.

Apparatus and method for manufacturing display device

Provided are a display device and a method of manufacturing the display device. The display device includes a substrate including a display area and a peripheral area outside the display area, a plurality of data lines disposed in the display area, a plurality of lines disposed in the display area, respectively connected to the plurality of data lines, and configured to respectively transmit a data signal from a driving circuit disposed in the peripheral area to the plurality of data lines, an insulating layer covering the plurality of lines; and a light-emitting element disposed on the insulating layer, wherein each of the plurality of lines comprises a plurality of branches branched in a direction crossing an extending direction of the line, and a black layer is disposed on an insulating layer at a position corresponding to an interval between a plurality of adjacent branches in a vertical direction.

Display device including black layer corresponding to interval between adjacent branches and method of manufacturing the same

A polishing slurry includes an abrasive material, a first oxide polishing promoter, a first nitride polishing inhibitor, and a second nitride polishing inhibitor. The first oxide polishing promoter includes a polymer-based oxide polishing promoter. The first nitride polishing inhibitor includes an anionic nitride polishing inhibitor. The second nitride polishing inhibitor includes at least one selected from a cationic nitride polishing inhibitor and a non-ionic nitride polishing inhibitor.

Polishing slurry and method of polishing substrate by using the polishing slurry

A substrate polishing apparatus includes a support part on which at least one substrate is disposed, a plurality of first moving parts disposed at both opposite sides of the support part in a second direction crossing a first direction, and configured to upwardly extend and reciprocate in the first direction, a second moving part disposed between the plurality of first moving parts in the second direction and connected to an upper side of the first moving parts, a plurality of polishing units disposed at a lower portion of the second moving part and configured to contact an upper surface of the substrate, and a plurality of nozzles disposed at the lower portion of the second moving part and configured to spray slurry to the substrate where the polishing units rotate and revolve along a predetermined trajectory.

A laser optical system including: a beam splitter configured to split a laser beam into a first light and a second light by reflecting a portion of the laser beam and transmitting another portion of the laser beam; a first reflective member located in a path of the first light and reflecting the first light; and a second reflective member located in a path of the first light and reflecting the first light toward the beam splitter after the first light is reflected by the first reflective member, wherein a portion of the first light reflected toward the beam splitter is incident on and passes through the beam splitter and at least partially overlaps the second light.

Laser optical system and laser annealing device including the same

A method of manufacturing a substrate includes: irradiating, along a first path, a laser beam emitted from a source onto a substrate, wherein the substrate includes a target layer of the laser beam, and wherein the substrate is disposed on a stage; and irradiating, along a second path, a portion the laser beam, which was emitted from the source and reached the target layer, by reflecting the laser beam back onto the target layer using a reflection mirror. An area of a second region of the target layer is greater than an area of a first region of the target layer, wherein the laser beam is irradiated along the second path in the second region, and the laser beam is irradiated along the first path in the first region.

Method of manufacturing a substrate having a crystallized layer and a laser crystallizing apparatus for the same

A method of manufacturing a display apparatus includes forming an amorphous silicon layer on a substrate, splitting a first laser beam emitted from a first laser source into a first master beam in a first polarization state and a second master beam in a second polarization state, changing the first polarization state of the first master beam to the second polarization state to output a third master beam having the second polarization state and corresponding to the first master beam having the second polarization state, combining the second master beam with the third master beam to output a merged laser beam, and irradiating the amorphous silicon layer with the merged laser beam to form a polysilicon layer.

Growing community of inventors

Yongin-si, South Korea

Byoungkwon Choo