Robert Bosch

Burkhard Kuhlmann

Reinhard Neul

Daniel Christoph Meisel

Udo-Martin Gomez

Thorsten Balslink

Joerg Hauer

Wolfram Bauer

Rainer Willig

Johannes Classen

Rolf Scheben

Torsten Ohms

Benjamin Schmidt

Christoph Lang

Jochen Franz

Christian Doering

Udo Bischof

Andreas Lassl

Nils Felix Kuhlmann

Peter Degenfeld-Schonburg

Niels Bode

Jan-Timo Liewald

Mirko Hattass

Matthias Kuehnel

Markus Lutz

Karsten Funk

Axel Franke

Oliver Kohn

Odd-Axel Pruetz

Michael Fehrenbach

Kersten Kehr

Michael Veith

Gerhard Wucher

Andreas Thomae

Siegbert Goetz

Jens Frey

Mathias Reimann

Ermin Esch

Robert Maul

Robert Sattler

Christian Hoeppner

Dieter Maurer

Ralf Ameling

Matthias Meier

Hans-Dieter Schwarz

Andreas Lassi

Jochen Reinmuth

Michael Baus

Patrick Wellner

Holger Hoefer

Markus Heitz

Martin Wrede

Carsten Geckeler

Patrick Goerlich

Gregor Wetekam

Emma Abel

Udo Gomez

Riad Stefo

Wolfgang Fuerst

A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Micromechanical rate-of-rotation sensor set-up, rate-of-rotation sensor array and corresponding manufacturing method

A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater extension in the first main-extension-direction than in the second main-extension-direction.

Rotation-rate sensor, method for producing a rotation-rate sensor

A yaw-rate sensor with a substrate having a main extension plane. The yaw-rate sensor includes a rotation-element assembly, the rotation-element assembly being designed for detecting yaw rates prevailing in a first main extension axis of the substrate and yaw rates prevailing in a second main extension axis of the substrate perpendicular to the first main extension axis. The yaw-rate sensor has a sensor assembly, the sensor assembly being designed for detecting a yaw rate prevailing perpendicular to the main extension plane of the substrate, both the sensor assembly and the rotation-element assembly being drivable with the aid of a drive assembly, the drive assembly being designed for driving movement along the first main extension axis.

Yaw-rate sensor with a substrate having a main extension plane, method for manufacturing a yaw-rate sensor

A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Three-axis micromechanical rotation rate sensor system including linearly and rotatorily drivable sensor units

A sensor includes a substrate having a first electrode arrangement; a first mass oscillator having (a) a first mass, (b) a first mass centroid, and (c) a second electrode arrangement including a first area centroid coinciding with the first mass centroid; and a second mass oscillator having (a) a second mass equal to the first mass, (b) a second mass centroid coinciding with the first mass centroid, and (c) a third electrode arrangement including a second area centroid coinciding with the first area centroid. Areas of the second and third electrode arrangements are equal. The sensor detects respective rotation rates around axes parallel to and perpendicular to a substrate extension. The oscillators are oscillatorily connected to each other and to the substrate, are deflectable, and experience respective forces in the directions of extension of the axes upon respective rotations around the other of the axes.

One-axis and two-axis rotation rate sensor

A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

Micromechanical rotational rate sensor system and corresponding production method

A rotation rate sensor including a substrate having a principal plane of extension, and a structure movable with respect to the substrate; the structure being excitable from a neutral position into an oscillation having a movement component substantially parallel to a driving direction, which is substantially parallel to the principal plane of extension. To induce the oscillation, the rotation rate sensor includes a comb electrode moved along with the structure and a comb electrode fixed in position relative to the substrate. The excitation is produced by applying a voltage to the moving comb electrode and/or to the stationary comb electrode. Due to a rotation rate of the rotation rate sensor about an axis running substantially perpendicularly to the driving direction and substantially perpendicularly to the detection direction, a force applied to the structure with a force component along a detection direction substantially perpendicular to the driving direction is detectable.

MEMS rotation rate sensor including combined driving and detection

A rotation rate sensor having a first structure movable with respect to the substrate, a second structure movable with respect to the substrate and with respect to the first structure, a first drive structure for deflecting the first structure with a motion component parallel to a first axis, and a second drive structure for deflecting the second structure with a motion component parallel to the first axis. The first and second structures are excitable to oscillate in counter-phase, with motion components parallel to the first axis, the first drive structure having a first spring mounted on the substrate to counteract a pivoting of the first structure around an axis parallel to a second axis extending perpendicularly to a principal extension plane, the second drive structure having a second spring mounted on the substrate to counteracts a pivoting of the second structure around a further axis parallel to the second axis.

Rotational speed sensor with minimized interference movements in the driving mode

A rotation rate sensor includes first, second, third and fourth structures that are each movable relative to a substrate, a drive device configured to deflect each of the first, second, third, and fourth structures essentially parallel to a drive direction and out of respective resting positions of the first, second, third, and fourth structures, such that, at a first frequency, the first and fourth structures are excitable to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the second and third structures, and, at a second frequency, the first and second structures are excitable to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the third and fourth structures.

Rotation rate sensor with multiple evaluation during operation at several frequencies

A method for producing thin MEMS chips on SOI substrate including: providing an SOI substrate having a silicon layer on a front side and having an oxide intermediate layer, producing a layer structure on the front side of the SOI substrate and producing a MEMS structure from this layer structure, capping the MEMS structure and producing a cavity, and etching a back side of the SOI substrate down to the oxide intermediate layer. Also described is a micromechanical component having a substrate, a MEMS layer structure having a MEMS structure in a cavity and a cap element, the MEMS structure and its cavity being enclosed by the substrate underneath and the cap element above, the substrate being made of polycrystalline silicon.

Method for producing thin MEMS chips on SOI substrate and micromechanical component

A rotation rate sensor including a substrate having a main plane of extension, a first rotation rate sensor structure for detecting a first rotation rate about an axis that is in parallel to a first axis extending in parallel to the main plane of extension, and a second rotation rate sensor structure for detecting a second rotation rate about an axis that is parallel to a second axis extending perpendicularly with respect to the main plane of extension. Also included is drive device for deflecting a first structure of the first rotation rate sensor structure, and a second structure of the first rotation rate sensor structure, and also for deflecting a third structure of the second rotation rate sensor structure, and a fourth structure of the second rotation rate sensor structure, in such a way that the first, second, third, and fourth structures are excitable into a mechanically coupled oscillation.

Dual-axis ultra-robust rotation rate sensor for automotive applications

A rotation rate sensor for detecting a rotational movement of the rotation rate sensor about a rotational axis extending within a drive plane of the rotation rate sensor include: a first rotational element, a second rotational element and a drive structure moveable in parallel to the drive plane, the first rotational element being drivable about a first center of rotation to achieve a first rotational vibration in parallel to the drive plane, the second rotational element being drivable about a second center of rotation to achieve a second rotational vibration in parallel to the drive plane, the drive structure being (i) coupled to the first and second rotational elements, and (ii) configured to generate a drive mode in phase opposition of the first and second rotational vibrations.

Rotation rate sensor and a method for operating a rotation rate sensor

A yaw rate sensor () includes a movable mass structure () and a drive component () which is suitable for setting the movable mass structure () in motion (), and an analysis component () which is suitable for detecting a response () of the movable mass structure () to a yaw rate (&#x3a9;). A method for functional testing of a yaw rate sensor () includes the following steps: driving a movable mass structure (), feeding a test signal () into a quadrature control loop () at a feed point () of the quadrature control loop (), feeding back a deflection () of the movable mass structure (), detecting a measure of the feedback of the movable mass structure (), and reading out the response signal () from the quadrature control loop (). In the yaw rate sensor () and also in the method, the readout of the response signal () in relation to a processing direction () of the test signal () is provided between a feed point () for a test signal () and an actuator () for feeding back a deflection () of the movable mass structure ().

Self-test for yaw rate sensors

A rotation-rate sensor having a substrate with main extension plane, for detecting a rotation rate, extending in a direction parallel/orthogonal to the main plane; the sensor including a primary/secondary pair of seismic masses; the primary pair having first/second primary masses; the secondary pair having first/second secondary masses; the first/second primary masses being movable relative to the substrate along a primary deflection direction extending parallel to the main plane; the first/second secondary masses being movable relative to the substrate along a secondary deflection direction extending parallel to the main plane; the first/second primary masses and the first/second primary masses being movable antiparallel or parallel to one another corresponding to the deflection direction, essentially extending orthogonally to the secondary deflection direction; and the primary pair and/or secondary pair being drivable so that, based on sensor rotation, the Coriolis force leads to deflection of the first/second primary masses and/or the first/second secondary masses.

Rotation-rate sensor having a substrate having a main extension plane for detecting a rotation rate

A yaw-rate sensor having a substrate and a plurality of movable substructures that are mounted over a surface of the substrate, the movable substructures being coupled to a shared, in particular, central spring element, means being provided for exciting the movable substructures into a coupled oscillation in a plane that extends parallel to the surface of the substrate, the movable substructures having Coriolis elements, means being provided for detecting deflections of the Coriolis elements induced by a Coriolis force, a first Coriolis element being provided for detecting a yaw rate about a first axis, a second Coriolis element being provided for detecting a yaw rate about a second axis, the second axis being oriented perpendicularly to the first axis.

Yaw-rate sensor

Growing community of inventors

Reutlingen, Germany

Burkhard Kuhlmann