Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Bum-Ki Baek

Jeong-Young Lee

Jong-Soo Yoon

Kwon-Young Choi

Jang-Soo Kim

Mun-Pyo Hong

Woon-Yong Park

Sang-Ki Kwak

Min-Wook Park

Dong-Gyu Kim

Sung-Wook Huh

Jun-Hyung Souk

Hee-Joon Kim

Sang-Jin Jeon

Jung-Joon Park

Jae-Hong Jeon

Byoung-Sun Na

Sung-Hoon Yang

Sung-jae Moon

Se-Hwan Yu

Yoon-Jang Kim

Eun Jeong Cho

Han-Ju Lee

Yun-Jung Cho

Kwang-Hoon Lee

Yeon-Ju Kim

Sung-Wook Hao

Jong-in Kim

Jun-Ho Song

Young-Soo Yoon

Hyuk-Jin Kim

Kyung-Phil Lee

San-Jin Jeon

Doug-Gyu Kim

A display substrate includes a data line, a main gate line, and a first sub-pixel electrode formed on a base substrate. The display substrate further includes a first switching element connected to the data line. The display substrate further includes a second switching element connected to the data line, the main gate line, and a second sub-pixel electrode spaced apart from the first sub-pixel electrode. The display substrate further includes a third switching element connected to the data line and a secondary gate line adjacent to the main gate line. The display substrate further includes a shielding line spaced apart from the first and second sub-pixel electrodes, the shielding line overlapping the data line and receiving a reference voltage. The display substrate further includes an auxiliary electrode extending from the shielding line and overlapping an end electrode connected to the third switching element.

Display substrate including an auxiliary electrode

A photomask includes; a source electrode pattern including; a first electrode portion which extends in a first direction, a second electrode portion which extends in the first direction and is substantially parallel to the first electrode portion, and a third electrode portion which extends from a first end of the first electrode portion to a first end of the second electrode portion and is rounded with a first curvature, a drain electrode pattern which extends in the first direction and is disposed between the first electrode portion and the second electrode portion, wherein an end of the drain electrode pattern is rounded to correspond to the third electrode portion; and a channel region pattern which is disposed between the source electrode pattern and the drain electrode pattern, wherein a center location of the first curvature and a center location of the rounded portion of the end of the drain electrode pattern are the same.

Photomask and thin-film transistor fabricated using the photomask

A liquid crystal display includes opening patterns in the electrodes or protrusions on the electrodes. The opening patterns or the protrusions have a pattern which controls the direction of the liquid crystal molecules. Thus the quality of the LCD can be improved.

Liquid crystal display and method for manufacturing the same

A method of manufacturing a thin film transistor array panel is provided, the method includes: forming a gate line on an insulating substrate; forming a gate insulating layer; forming a semiconductor layer; forming a data conductive layer including a data line and a drain electrode; depositing a passivation layer; forming a photoresist including a first portion located on an end portion of the gate line, a second portion thicker than the first portion and located on the drain electrode, and a third portion thicker than the second portion; exposing a portion of the passivation layer under the second portion of the photoresist and a portion of the gate insulating layer under the first portion of the photoresist by etching using the photoresist as an etch mask; forming first and second contact holes exposing the drain electrode and the end portions of the gate line, respectively; and forming a pixel electrode connected to the drain electrode through the first contact hole.

Thin film transistor array panel and manufacturing method thereof

Liquid crystal display and a method for manufacturing the same

A thin film transistor (TFT) array panel that includes a substrate, a gate wire including a gate pad, a gate insulating layer pattern, a semiconductor layer pattern, an ohmic contact layer pattern, a data wire including a data pad and a drain electrode, and a passivation layer pattern is presented. The passivation layer pattern is formed on the data wire and has contact holes exposing the gate pad, the data pad, and the drain electrode. The passivation layer pattern also has a planar shape that is similar that of the semiconductor layer pattern due to simultaneous etching except for the portions adjoining the drain electrode and the data pad, having a width greater than that of the data wire, and covering a boundary line of the data wire. A pixel electrode is electrically connected to the exposed portion of the drain electrode and contacts the gate insulating layer pattern.

Method for manufacturing a thin film transistor array panel for a liquid crystal display and a photolithography method for fabricating thin films

A thin film transistor array panel is provided, which includes a substrate; a gate line formed on the substrate and including a gate electrode; a gate insulating layer formed on the gate line; a semiconductor layer formed on the gate insulating layer; a plurality of ohmic contacts formed on the semiconductor layer; source and drain electrodes formed on the ohmic contacts; a passivation layer formed on the source and the drain electrodes and having a first contact hole exposing a portion of the drain electrode and an opening exposing a first portion of the semiconductor layer and having edges that coincide with edges of the source and the drain electrodes; and a pixel electrode formed on the passivation layer and contacting the drain electrode through the first contact hole.

A method of manufacturing a thin film transistor array panel is provided, the method including forming a thin film transistor having a gate electrode, a source electrode, and a drain electrode on a substrate, forming a passivation layer on the source electrode and the drain electrode, forming a photoresist film on the passivation layer, selectively etching the passivation layer using the photoresist film as a mask, forming a conductive film, and removing the photoresist film along with the conductive film disposed on the photoresist film using a CMP (chemical mechanical polishing) process to form a pixel electrode being connected to the drain electrode.

Method of manufacturing a thin film transistor array panel that includes using chemical mechanical polishing of a conductive film to form a pixel electrode connected to a drain electrode

A thin film transistor (TFT) array panel that includes a substrate, a gate wire formed on the substrate, a gate insulating layer pattern formed on the gate wire, a semiconductor layer pattern formed on the gate insulating layer pattern, an ohmic contact layer pattern formed on the semiconductor layer pattern, a data wire formed on the ohmic contact layer pattern, a passivation layer pattern formed on the data wire, and a pixel electrode is presented. The data wire includes a data pad. The ohmic contact layer pattern includes a portion disposed under the data pad that is simultaneously etched as the data pad, and a contact hole in the passivation layer is etched simultaneously as a contact hole in the gate insulating layer.

A conductive layer, including a lower layer made of refractory metal such as chromium, molybdenum, and molybdenum alloy and an upper layer made of aluminum or aluminum alloy, is deposited and patterned to form a gate wire including a gate line, a gate pad, and a gate electrode on a substrate. At this time, the upper layer of the gate pad is removed using a photoresist pattern having different thicknesses depending on position as etch mask. A gate insulating layer, a semiconductor layer, and an ohmic contact layer are sequentially formed. A conductive material is deposited and patterned to form a data wire including a data line, a source electrode, a drain electrode, and a data pad.

Thin film transistor array panels for a liquid crystal display and a method for manufacturing the same

A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode and a pair of redundant electrodes on the first and the second portions of the lower conductive film, respectively, the redundant electrodes exposing a part of the second portion of the lower conductive film; removing the exposed part of the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.

Method of manufacturing a thin film transistor array panel

A liquid crystal display (LCD) includes a gate line, a data line, and a pixel electrode including first and second sub-pixel electrodes to which different voltages are applied. A thin film transistor is coupled with the gate line and the data line to apply a voltage to the pixel electrode, and a storage electrode partially overlaps with the first and second sub-pixel electrodes. The first sub-pixel electrode is arranged on all but one side of the second sub-pixel electrode, portions of a first side of the storage electrode overlap with the boundaries of the first and second sub-pixel electrodes, portions of a second side of the storage electrode protrude and partially overlap with the second sub-pixel electrode, and the storage electrode comprises a storage electrode extension, which protrudes from the second side of the storage electrode across the first sub-pixel electrode and overlaps with the second sub-pixel electrode.

Liquid crystal display device with storage electrode extension

Growing community of inventors

Suwon-si, South Korea

Bum-Ki Baek