Micron Technology Incorporated

Bryan J Ludwig

Timothy James Kennedy

Shon Brunelli

Ernest E Marks

David A Cathey

Scott E Moore

L Brian Dunn

Loyal R Gibbons

Leo B Jurica

Jay D Barnett

A brush alignment apparatus and method of using the same for aligning a hollow cylindrical brush on a cylindrical roller member comprising first and second ends and an outer surface defining a internal cavity, provided with a plurality of orifices extending from the outer surface to the internal cavity, a first receptacle having a channel running therethrough in fluid communication with the first end of the roller member, a second receptacle, a spine member, a first support arm supporting the first end of the roller member and a second arm supporting the second end of the roller member. In operation, the brush is applied onto the surface of the roller such that the inner surface of the brush and the outer surface of the roller are in frictional communication with one another, a layer of fluid is generated between the surfaces of the roller and the brush sufficient to substantially dissipate any frictional contact between the brush and the roller, the layer is maintained between the surfaces of the roller and the brush for sufficient time and at sufficient strength to allow the brush to attain a position of static alignment, at which time the layer is allowed to dissipate thereby returning the brush to a position of frictional communication with the surface of the roller, while substantially retaining it in a state of static alignment.

Brush alignment method

Brush alignment platform

Improvements to an integrated circuit wafer rinsing and washing machine which include a streamlined housing for low turbulence air flow, improved rear maintenance capability, improved wafer carriers, foot operated switches and improved rotating part fastening means.

Wafer rinser/dryer

Apparatus to enclose a resistivity probe, to be used with a semiconductor wafer washer. Said apparatus is detachable and easy to maintain; is made of readily available and inexpensive plumbing parts; substantially encloses said probe, reducing contamination; allows nitrogen purge of said probe, keeping it clean; fully submerges said probe in discharge fluid, improving measurement accuracy; and is compact enough to allow washers to be triple stacked.

Resistivity probe fixture

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Boise, ID, United States of America

Bryan J Ludwig