Fujifilm Electronic Materials U.s.a., Inc.

Bryan Hinzie

Marcia Jo Cole-Yocom

Yuan Chen

Pejman Ahmadiannamini

Jack Helzer

Michael R Barker

Eduardo Ramirez Romero

Shen-Ping Huang

Perry Westberg

Jack W Helzer

Marcia Cole-Yocom

A chemical liquid manufacturing apparatus is provided. The manufacturing apparatus includes at least one filtration medium selected from an ion exchange medium and an ion medium, and a temperature control unit configured to control the temperature of a material to be processed by the at least one filtration medium. A method of manufacturing a chemical liquid using the apparatus is also provided.

Chemical liquid manufacturing apparatus and method of manufacturing chemical liquid

A container for containing a raw material of a chemical liquid and a method of preparing a container are provided. The container at least includes an inner wall and solvent-treated surface of the inner wall. The method of preparing a container includes treating a surface of the inner wall with water and treating the surface the inner wall with an organic solvent.

Container and method of preparing the same

The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

Systems and methods for purifying solvents

A method for process a chemical liquid is provided. The method includes at least providing a system having at least one filtration medium, treatment the system with a treatment liquid having a content of iron (Fe) and calcium (Ca) of about 10 ppb or less, and processing a chemical liquid using an apparatus having the system configured therein after the treatment process.

Method for processing chemical liquid

A chemical liquid manufacturing apparatus is provided. The manufacturing apparatus at least includes an ion exchange medium and an ion adsorption medium configured downstream from the ion exchange medium. A material of the ion adsorption medium includes a resin material having an amide bond or an imide bond. A manufacturing method of a chemical liquid using the apparatus is also provided.

Chemical liquid manufacturing apparatus and manufacturing method of chemical liquid

The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used, e.g., as pre-wet liquids, solution developers, and cleaners in a multistep semiconductor manufacturing process.

A chemical liquid manufacturing apparatus, including a first system and a second system, is provided. The first system includes at least one first filtration medium, selected from a first filter, a first ion exchange membrane and a first ion adsorption membrane, wherein the first system is configured to process a material of at least one time. The second system includes at least one second filtration medium, selected from a second filter, a second ion exchange membrane and a second ion adsorption membrane, wherein the second system is configured for recirculation and to process the material of at least two times.

Chemical liquid manufacturing apparatus

The present disclosure is directed to methods of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

Growing community of inventors

Gilbert, AZ, United States of America

Bryan Hinzie