Saint-gobain Performance Plastics Corporation

Bryan David Hirschorn

Michael John Mangaudis

David Wilkinson

Colleen E Hamilton

The disclosure is directed to a chemical mechanical polishing retaining ring including a polymer matrix and a filler including polyimide. The chemical mechanical polishing retaining ring has a wear rate performance not greater than about 75 microns/hour.

Chemical mechanical polishing retaining ring, apparatuses and methods incorporating same

In one embodiment, the disclosure is directed to a chemical mechanical polishing retaining ring. The chemical mechanical polishing retaining ring includes a support formed of a first material comprising a first polymer and a wear portion formed of a second material comprising a second polymer. The first material has an elastic modulus greater than the elastic modulus of the second material.

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Leominster, MA, United States of America

Bryan David Hirschorn