Lawrence Livermore National Security, LLC

University of California

Bryan D Moran

Eric B Duoss

Christopher M Spadaccini

Julie A Jackson

Marcus A Worsley

Patrick G Campbell

Juergen Biener

Tiziana C Bond

James S Oakdale

Mihail Bora

Maxim Shusteff

Joshua R Deotte

Jordan S Miller

Jianchao Ye

Xiaoyu Zheng

Brian J Bauman

Elaine Lee

Hayden Kingsley Taylor

William Smith

Brett Kelly

Ryan Hensleigh

Nikola Dudukovic

Wen Chen

Logan Bekker

James F McCarrick

Caitlyn Christian Krikorian

Michael A Engel

Maria C Prieto Conaway

Matthew Kenneth Gelber

A large area projection micro stereolithography (LAPμSL) system uses an addressable spatial light modulator (SLM) in coordination with an optical scanning system to make very large stereolithographically produced objects. The SLM is imaged onto a photosensitive material with an optical system that has the ability to scan the image over a large area and speedily manufacture large scale complex three dimensional components with micro scale features.

Large area projection micro stereolithography

The present disclosure relates to a system for performing scanning projection stereolithography. The system uses a light projector which is configured to generate a polymerizing optical signal to initiate polymerization of a photopolymerizable resin or material at a build plane. An optics subsystem collimates and focuses the polymerizing optical signal. The optics subsystem is movable relative to the build plane to optimize focus of the polymerizing optical signal at the build plane. A light scanning subsystem directs the polymerizing optical signal received from the optics subsystem to selected X axis and Y axis locations on the build plane. A positioning subsystem positions the optics subsystem at a selected location relative to the build plane, where the selected location is chosen to optimize focusing of the polymerizing optical signal at a specific, selected X/Y location on the build plane.

Diagnostics and resolution optimization for scanning projection stereolithography

Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereolithography system is capable of generating the product by optically polymerizing successive layers of a curable resin at a build plane. The controller is capable of analyzing a focus level of the reference target based on the captured image; and based on the analyzing, adjusting a focus property of the projected image beam of the stereolithography system.

Methods of calibration of a stereolithography system

A large area projection micro stereolithography (LAPuSL) system uses an addressable spatial light modulator (SLM) in coordination with an optical scanning system to make very large stereolithographically produced objects. The SLM is imaged onto a photosensitive material with an optical system that has the ability to scan the image over a large area and speedily manufacture large scale complex three dimensional components with micro scale features.

The present disclosure relates to a method for forming a three dimensional (3D) component from a photopolymer resin. The method may involve generating a first optical beam at a first wavelength, with the first optical beam causing polymerization of a photopolymerizable resist. A second optical beam is generated at a second wavelength, different from the first wavelength, which inhibits polymerization of the photopolymerizable resist. A device is used to receive the first and second optical beams and to generate therefrom corresponding separate first and second light patterns, respectively, where the first light pattern forms a first image on the photopolymerizable resist to cause polymerization of a first portion of the photopolymerizable resist, while the second light pattern forms a second image on the photopolymerizable resist and inhibits polymerization of a second portion of the photopolymerizable resist.

Dual wavelength negative imaging DLP-SLA system and method

A method of forming a three-dimensional structure of liquid crystal (LC) elastomers includes contacting a resin layer of LC oligomers with a layer of photoalignment material, and exposing a portion of photoalignment material to light for aligning the portion of photoalignment material in a first orientation. The LC oligomers adjacent the illuminated portion of photoalignment material align to the first orientation of the illuminated portion. The portion of aligned LC oligomers of the resin layer are cured. Operations for forming additional layers include creating a relative movement of the resin layer away from the photoalignment material, contacting another resin layer with the photoalignment material, and exposing another portion of photoalignment material to light for aligning the photoalignment material in a different orientation. The LC oligomers adjacent the illuminated portion of photoalignment material align to the different orientation, and the portion of aligned LC oligomers of the resin layer are cured.

Stereolithography additive manufacturing of photoaligned liquid crystal elastomers

The present disclosure relates to a lattice substrate adapted for use in direct ionization mass spectrometry. The substrate may have a plurality of tessellated unit cells forming an integral structure. Each tessellated unit cell may have a dimension of no more than about 1.5 mm and may include a plurality of pores arranged in an ordered pattern. The substrate may further include a form factor suitable for use with a direct ionization mass spectrometry system.

Systems and methods lattice spray substrates for mass spectrometry

The present disclosure relates to a digital light projector (DLP) system which has first and second light sources. The first optical source may generate a first beam at a first wavelength which causes polymerization of a photopolymerizable resist. The second optical source may generate a second beam at a second wavelength different from the first wavelength, and where the second beam inhibits polymerization of the photopolymerizable resist. A digital micromirror device (DMD) is included which has a plurality of micromirrors and is configured to be illuminated by the first and second beams and to generate a pattern on the micromirrors which has light from the first and second light wavelengths controlled by the micromirror position. The first light image causes polymerization of a first portion of the photopolymerizable resist, while the second image inhibits polymerization of a second portion of the photopolymerizable resist.

Dual wavelength negative imaging DLP-SLA system

The present disclosure relates to a system for forming a three dimensional (3D) part. The system may incorporate a beam delivery subsystem for generating optical signals, and a mask subsystem that receives the optical signals and generates optical images therefrom. A first one of the optical images activates a polymerization species of a photo-sensitive resin in accordance with illuminated areas thereof, to thus cause polymerization of select portions of the photo-sensitive resin to help form a layer of the 3D part. A second one of the optical images causes stimulated emission depletion of subportions of the polymerization species, simultaneously, over various areas of the layer, to enhance resolution of at least one subportion of the select portions of the photo-sensitive resin.

System and method for stimulated emission depletion projection stereolithography

In one embodiment, a composition of matter includes: a plurality of ligaments each independently comprising one or more layers of graphene; where the plurality of ligaments are arranged according to a deterministic three-dimensional (3D) pattern. In another embodiment, a method of forming a deterministic three-dimensional (3D) architecture of graphene includes: forming or providing a substrate structurally characterized by a predefined 3D pattern; forming one or more layers of metal on surfaces of the substrate; and forming one or more layers of graphene on surfaces of the metal.

Three-dimensional deterministic graphene architectures formed using three-dimensional templates

A method directs a gas of interest into a minicell and uses an emitting laser to produce laser emission light that is directed into the minicell and onto the gas of interest. The laser emission light is reflected within the cell to make multipasses through the gas of interest. After the multipasses through the gas of interest the laser light is analyzed to produces gas spectroscopy data. The minicell receives the gas of interest and a transmitting optic connected to the minicell that directs a beam into the minicell and onto the gas of interest. A receiving optic connected to the minicell receives the beam from the gas of interest and directs the beam to an analyzer that produces gas spectroscopy data.

Growing community of inventors

Pleasanton, CA, United States of America

Bryan D Moran