Applied Materials, Inc.

Formfactor Beaverton, Inc.

Novellus Systems Incorporated

Applied Materials Israel Limited

Electro Scientific Industries, Inc.

Cascade Microtech, Inc.

Cascade Micotech, Inc.

Formfactor, Inc.

Bryan Conrad Bolt

Kazuki Negishi

Gilad Almogy

Ehud Tirosh

Boaz Kenan

Michael E Simmons

Joseph George Frankel

Michael Lawrence Corliss

Christopher Anthony Storm

Oded Arnon

Eric W Strid

David Martin Hemenway

Paul C Allen

Mark Kosmowski

Brady Nilsen

Anthony James Lord

Robbie Ingram-Goble

Gavin Neil Fisher

A Grey Lerner

Steve Harris

Richard Pope

Alan J Wickstrom

Probe systems for testing a device under test are disclosed herein. The probe systems include a platen that defines an upper surface, an opposed lower surface, and a platen aperture. The probe systems also include a chuck that defines a support surface configured to support a device under test. The probe systems further include a lower enclosure extending from the lower surface of the platen and an upper enclosure extending from the upper surface of the platen. The upper enclosure includes a side wall that defines a side wall aperture, and the side wall and the platen define an intersection angle of at least 30 degrees and at most 60 degrees. The probe systems also include a manipulator, a probe shaft arm, a probe assembly, a test head, and an electrical conductor.

Probe systems for testing a device under test

Shielded probe systems are disclosed herein. The probe systems are configured to test a device under test (DUT) and include a measurement chamber that at least partially bounds an enclosed volume, an aperture defined by the measurement chamber, a probing assembly, and a shielding structure. The probing assembly includes a probe, which is oriented within the enclosed volume, a probe arm, which is operatively attached to the probe, and a manipulator, which is operatively attached to the probe arm. At least a portion of the probing assembly extends through the aperture. The shielding structure extends between the measurement chamber and the probing assembly and is configured to restrict fluid flow through the aperture and shield the enclosed volume from an ambient environment that surrounds the measurement chamber while maintaining at least a threshold separation distance from the probe arm throughout a probe arm range-of-motion thereof.

Shielded probe systems

Probes with fiducial marks, probe systems including the same, and associated methods. The probes include a beam portion and a probe tip that is configured to contact a device under test (DUT), and further include a fiducial mark formed on the beam portion that is configured to facilitate alignment of the probe and the DUT. The fiducial mark is configured to be visible to an optical assembly, and is in focus to the optical assembly within a depth of field of the optical assembly that is smaller than a depth of field over which the beam portion is in focus to the optical assembly. The methods include methods of utilizing and/or manufacturing the probes.

Probes with fiducial marks, probe systems including the same, and associated methods

Systems and methods for simultaneous optical testing of a plurality of devices under test. These systems and methods may include the use of an optical probe assembly that includes a power supply structure that is configured to provide an electric current to a plurality of devices under test (DUTs) and an optical collection structure that is configured to simultaneously collect electromagnetic radiation that may be produced by the plurality of DUTs and to provide the collected electromagnetic radiation to one or more optical detection devices. The systems and methods also may include the use of the optical probe assembly in an optical probe system to evaluate one or more performance parameters of each of the plurality of DUTs.

Systems and methods for simultaneous optical testing of a plurality of devices under test

The present invention provides improved apparatus for ultraviolet (UV) cure of thin films. A central external reflector (CER) reflects UV light at different angles to compensate for non-uniformity of the deposited film on the substrate. The CER is positioned between the UV light source and the substrate and includes an actuator that can change the angle of reflection before and during UV cure.

Tunable-illumination reflector optics for UV cure system

Preferred embodiments of a purge gas port, laser beam attenuating input window, and laser shutter constitute subsystems of a UV laser optical system in which a laser beam is completely enclosed to reduce contamination of the optical system components. Purge gas is injected through multiple locations in a beam tube assembly to ensure that the optical component surfaces sensitive to contamination are in the flow path of the purge gas. The input window functions as a fixed level attenuator to limit photopolymerization of airborne molecules and particles. Periodically rotating optical elements asymmetrically in their holders reduces burn damage to the optics.

Optical component cleanliness and debris management in laser micromachining applications

Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.

Automatic optical inspection using multiple objectives

A multiple beam generator for use in a scanning system, wherein the generator includes an acousto-optic deflector (AOD) which during use receives a laser beam and generates a deflected beam, the deflection of which is determined by an AOD control signal; a diffractive element which generates an array of input beams from the deflected beam; and a control circuit which during operation generates the AOD control signal and varies a characteristic of the first control signal to account for errors in the scanning system.

Apparatus for multiple beam deflection and intensity stabilization

A counter-rotating anamorphic prism pair assembly with variable spacing allows the simultaneous adjustment of a prism pair using an adjustment member to circularize in cross section a range of elliptical laser beam cross sections. A first prism rotates and translates towards or away from an incident laser beam while a second prism simultaneously rotates towards or away from the laser beam in a fixed counter-rotating relationship with the first prism. The degree of rotation and translation is determined by a mechanical linkage connecting the two prisms.

Counter-rotating anamorphic prism assembly with variable spacing

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Beaverton, OR, United States of America

Bryan Conrad Bolt