U.S. Philips Corporation

Schott Spezialglas Gmbh

Lpkf Laser & Electronics Ag

Bruno Vitt

Gunter Frank

Birgit Lintner

Werner J Behr

Juergen Blankenburg

Karl-Heinz Dasecke

Heiner Kostlin

Joerg Kickelhain

Hans Auding

Lieselotte Brock

There is provided a UV-reflective interference layer system for transparent substrates with broadband anti-reflection properties in the visible wavelength range. The interference layer system includes at least four individual layers. Successive layers have different refractive indices and the individual layers contain UV and temperature-stable inorganic materials.

Method for making a UV-reflecting interference layer system

UV-reflective interference layer system

Coating for the structured production of conductors on the surface of

The optical interference filter is assembled from alternating amorphous SiO.sub.2 layers and layers made of mixed oxides chosen from

Optical interference filter

A thin-film heating element is formed of a temperature-stable, electrically insulating substrate having a thin, electrically conductive metal oxide film which is doped with foreign atoms which compensate each other in pairs and which each consist of at least one acceptor-forming element and one donor-forming element the metal oxide film being provided with connecting electrodes; the metal oxide film being doped with maximally 10% of each of the foreign atoms compensating each other in pairs, the quantity of the atoms differing maximally 10%.

Thin-film heating element

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Aachen, Germany

Bruno Vitt