Heraeus Quarzglas Gmbh & Co Kg

Bruno Uebbing

Bodo Kühn

Martin Trommer

Jan Vydra

Stefan Ochs

Waltraud Werdecker

Heinz Fabian

Wolfgang Englisch

Stephan Thomas

Bodo Kuehn

Johann Leist

Ralf Takke

Steffen Kaiser

Rainer Koeppler

Rainer Köppler

Rolf G&ouml;bel

Erich Rosin

Gero Fischer

Ulla Holst

The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: Said quartz glass blank can only be obtained in that a doped quartz glass obtained by flame hydrolysis of a compound containing silicon, titanium and/or fluorine is formed as a large volume rod-shaped starting body into a homogeneous quartz glass blank using several forming steps and is homogenized.

Quartz glass blank and method for producing said blank

The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties:

Quartz glass blank for an optical component, and manufacturing procedure and use thereof

The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, C, C, and C, respectively, with P being the pulse number and &#x3b5; being the energy density (in mJ/cm):[molecules/cm]=1&#xd7;10&#x3b5;,&#x2003;&#x2003;(2)[molecules/cm]=2&#xd7;10&#x3b5;,&#x2003;&#x2003;(3)[wt-ppm]=1,700&#xd7;&#x3b5;[mJ/cm]&#xb1;50.&#x2003;&#x2003;(4)The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses in the course of a homogenization treatment.

The present invention concerns a quartz glass blank for an optical component for the transmission of ultraviolet radiation of a wave length of 250 nm and under, as well as its utilization in microlithography in connection with ultraviolet radiation of a wavelength of 250 nm and under. Such quartz glass blank is to have low induced absorption, while being optimized in respect of compaction and de-compaction. The quartz glass blank according to the invention has the following properties:

Quartz glass blank for an optical component and its utilization

The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission &lE;1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850&deg; C. to 1600&deg; C. before the vitrification, the last stage comprising sintering at a temperature between 1300&deg; C. and 1600&deg; C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.

Quartz glass body for optical component and process for manufacture thereof

Based on a known process for the manufacture of opaque quartz glass, by mixing SiO particles and an additive which is volatile at a melting temperature, forming a body and melting said body with an advancing melt front forming in the body, it is proposed according to the invention that in order to reduce the danger of contamination, a body ( ) be formed with an inner bore ( ) and be heated in such a manner that the melt front ( ) advances from the inner bore ( ) to the outside. The article of pure opaque quartz glass according to the invention has high resistance to temperature change, high mechanical strength and good chemical durability. It is distinguished by an opening ( ) enclosed by an inner wall ( ), with an inner SiO surface layer ( ) having a layer thickness ranging from 30 mm to 500 mm and a density of at least 2.15 g/cm .

Process for making opaque quartz glass and opaque component made according to the process

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Alzenau, Germany

Bruno Uebbing