Panalytical B.v.

Malvern Panalytical B.v.

Bruno A R Vrebos

Waltherus W Van Den Hoogenhof

Petronella Emerentiana Hegeman

Charalampos Zarkadas

Gustaaf Christian Brons

Aleksandr Komelkov

Roelof De Lange

Waltherus Van Den Hoogenhof

Apparatus includes an X-ray source, a wavelength dispersive X-ray detector for measuring X-ray fluorescence (XRF) and an energy dispersive X-ray detectoragain for measuring X-ray fluorescence. Selected elements are measured using the wavelength dispersive process to reduce the overall measurement time compared with using only one of the two detectors or compared to a simple approach of measuring low atomic number elements with the wavelength dispersive detector and high atomic number elements with the energy dispersive detector. The selection can take place dynamically, in particular on the basis of the results of the energy-dispersive detector.

Quantitative X-ray analysis&#x2014;multi optical path instrument

A device () for the examination of at least one material sample () which can be inserted into the device () and is irradiated by means of electromagnetic waves (), notably X-rays; in the measuring position the material sample () can be subjected to irradiation by means of the electromagnetic waves () and during a change of sample the beam path () can be interrupted by means of a closure element () which can be moved into the beam path. The device is constructed in such a manner that the closure element () is provided with a reference sample () on its side which faces the rays () in a manner such that a reference measurement can be performed thereon during a change of sample.

Examination of material samples

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Almelo, Netherlands

Bruno A R Vrebos