Tokyo Electron Limited

Bruce Adair Altemus

Jacques Faguet

Ronald W Nasman

Scott W Lefevre

Kazuya Ichiki

Provided is a method of limiting exposure of a dispense chemical to air and meet dispense objectives in a dispense nozzle system, the method comprising: providing a sample requiring a dispense process of a dispense chemical using a dispense nozzle system; performing an opening cycle of dispense process steps to get the dispense nozzle system ready; dispensing a dispense chemical onto the sample; and performing a closing cycle of dispense process steps to prepare the nozzle system for non-use; repeating the operations of performing the opening cycle of dispense process steps, dispensing the chemical, and performing the closing cycle of dispense process steps a prescribed number of times depending on an application.

Dispense nozzle with a dynamic liquid plug

A method is provided for depositing a planarization layer over features on a substrate using sequential polymerization chemical vapor deposition. According to one embodiment, the method includes providing a substrate containing a plurality of features with gaps between the plurality of features, delivering precursor molecules by gas phase exposure to the substrate, adsorbing the precursor molecules on the substrate to at least substantially fill the gaps with a layer of the adsorbed precursor molecules, and reacting the precursor molecules to form a polymer layer that at least substantially fills the gaps.

Method for depositing a planarization layer using polymerization chemical vapor deposition

Processes for real time process control of the Polymer Dispersion Index (PDI) during polymerization processes. By tuning this chain length distribution in real time, a resulting polymer can have predetermined physical properties such as thickness, physical yield strength, decomposition time, thermal stability, etc. Techniques herein can dynamically control chain length distribution through use of a mass density measurement device located within a processing chamber and providing real time feedback of polymer growth. Chamber parameters can be controlled or modified before and during polymerization based on mass density feedback. Such chamber parameters can include pressure, temperature, chemistry, and process gas flow rates and flow periods.

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Scotia, NY, United States of America

Bruce Adair Altemus