Applied Materials, Inc.

Brij Datta

Adolph Miller Allen

Fuhong Zhang

William R Johanson

Yu Liu

Keith A Miller

Prashanth Kothnur

Target profile for a physical vapor deposition chamber target

Methods and apparatus for a magnetron assembly are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis and rotatable about the central axis, a closed loop magnetic pole coupled to a first surface of the shunt plate and disposed 360 degrees along a peripheral edge of the shunt plate, and an open loop magnetic pole coupled at a the first surface of the shunt plate wherein the open loop magnetic pole comprises two rows of magnets disposed about the central axis.

Magnetron assembly for physical vapor deposition chamber

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Cupertino, CA, United States of America

Brij Datta