Average Co-Inventor Count = 4.22
ph-index = 8
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Western Digital Technologies, Inc. (35 from 5,311 patents)
2. Hitachi Global Storage Technologies Netherlands B.v. (19 from 2,636 patents)
3. International Business Machines Corporation (6 from 164,135 patents)
4. Hgst Netherlands, B.v. (4 from 987 patents)
5. Tokyo Institute of Technology (3 from 566 patents)
6. Other (1 from 832,718 patents)
7. Sandisk Technologies Inc. (1 from 4,529 patents)
8. X-ray Optical Systems Incorporated (1 from 59 patents)
9. Hitachi Global Storage Technologies (1 from 52 patents)
68 patents:
1. 12487296 - Spin orbit torque based thermal sensor for insitu monitoring of magnetic recording head
2. 12482588 - Nitrogen doped oxides for lower bandgap
3. 12417782 - Multilayer structures for magnetic recording devices to facilitate targeted magnetic switching and low coercivity
4. 12412597 - Non-localized spin valve multi-free-layer reader hybridized with spin orbit torque layers
5. 12408560 - Buffer layers and interlayers that promote BiSbx (012) alloy orientation for sot and MRAM devices
6. 12405323 - Magnetic sensor half-bridge based on inverse spin hall effect with reduced thermal drift
7. 12394432 - Non-localized spin valve reader hybridized with spin orbit torque layer
8. 12354627 - Higher areal density non-local spin orbit torque (SOT) writer with topological insulator materials
9. 12354629 - SOT reader with recessed SOT topological insulator material
10. 12334123 - Spin-orbit torque SOT reader with recessed spin hall effect layer
11. 12207563 - Magnetoresistive devices comprising a synthetic antiferromagnetic coupling layer of RuAl having a (110) texture
12. 12176132 - Highly textured 001 BiSb and materials for making same
13. 12154603 - Spin-orbit torque (SOT) writer with topological insulator materials
14. 12136446 - TDMR SOT read heads having recessed topological insulator materials
15. 12125512 - Doping process to refine grain size for smoother BiSb film surface