Sandia Corporation

University of New Mexico

Brian R Stallard

Sumanth Kaushik

Steven Roy Julien Brueck

William C Sweatt

John R McNeil

Michael R Descour

S Sohail Naqvi

Stephen M Gentry

Kenneth P Bishop

Gary D Tipton

Carter L Grotbeck

Kirt C Hickman

Susan M Gaspar

Clinton A Boye

A programmable optical filter for use in multispectral and hyperspectral imaging. The filter splits the light collected by an optical telescope into two channels for each of the pixels in a row in a scanned image, one channel to handle the positive elements of a spectral basis filter and one for the negative elements of the spectral basis filter. Each channel for each pixel disperses its light into n spectral bins, with the light in each bin being attenuated in accordance with the value of the associated positive or negative element of the spectral basis vector. The spectral basis vector is constructed so that its positive elements emphasize the presence of a target and its negative elements emphasize the presence of the constituents of the background of the imaged scene. The attenuated light in the channels is re-imaged onto separate detectors for each pixel and then the signals from the detectors are combined to give an indication of the presence or not of the target in each pixel of the scanned scene. This system provides for a very efficient optical determination of the presence of the target, as opposed to the very data intensive data manipulations that are required in conventional hyperspectral imaging systems.

Information-efficient spectral imaging sensor

A resonant planar optical waveguide probe for measuring critical dimensions on an object in the range of 100 nm and below. The optical waveguide includes a central resonant cavity flanked by Bragg reflector layers with input and output means at either end. Light is supplied by a narrow bandwidth laser source. Light resonating in the cavity creates an evanescent electrical field. The object with the structures to be measured is translated past the resonant cavity. The refractive index contrasts presented by the structures perturb the field and cause variations in the intensity of the light in the cavity. The topography of the structures is determined from these variations.

Near field optical probe for critical dimension measurements

An optical filter includes a dielectric layer formed within a resonant optical cavity, with the dielectric layer having formed therein a sub-wavelength periodic structure to define, at least in part, a wavelength for transmission of light through the resonant optical cavity. The sub-wavelength periodic structure can be formed either by removing material from the dielectric layer (e.g. by etching through an electron-beam defined mask), or by altering the composition of the layer (e.g. by ion implantation). Different portions of the dielectric layer can be patterned to form one or more optical interference filter elements having different light transmission wavelengths so that the optical filter can filter incident light according to wavelength and/or polarization. For some embodiments, the optical filter can include a detector element in optical alignment with each optical interference filter element to quantify or measure the filtered light for analysis thereof. The optical filter has applications to spectrometry, colorimetry, and chemical sensing.

Optical filter including a sub-wavelength periodic structure and method

In microelectronics manufacturing, an arrangement for monitoring and control of exposure of an undeveloped photosensitive layer on a structure susceptible to variations in optical properties in order to attain the desired critical dimension for the pattern to be developed in the photosensitive layer. This is done by ascertaining the intensities for one or more respective orders of diffracted power for an incident beam of radiation corresponding to the desired critical dimension for the photosensitive layer as a function of exposure time and optical properties of the structure, illuminating the photosensitive layer with a beam of radiation of one or more frequencies to which the photosensitive layer is not exposure-sensitive, and monitoring the intensities of the orders of diffracted radiation due to said illumination including at least the first order of diffracted radiation thereof, such that when said predetermined intensities for the diffracted orders are reached during said illumination of photosensitive layer, it is known that a pattern having at least approximately the desired critical dimension can be developed on the photosensitive layer.

Diffracted light from latent images in photoresist for exposure control

Growing community of inventors

Albuquerque, NM, United States of America

Brian R Stallard