Promerus, Lcc

Sumitomo Bakelite Company Limited

Brian F Knapp

Edmund Elce

Hendra Ng

Cheryl Burns

Andrew Bell

Wei Zhang

Larry Funderburk Rhodes

Pramod Kandanarachchi

Sridevi Kaiti

Xiaoming Wu

Christopher Apanius

Robert A Shick

Leah Langsdorf

Keitaro Seto

Kazuyoshi Fujita

Dino Amoroso

Brian Bedwell

Hiromichi Sugiyama

Royce Groff

Crystal D Cyrus

Dane Jablonski

Ryan M Wilks

Rajesh Raja Puthenkovilakom

Makoto Horii

Seishi Ohashi

Brian Kocher

Yogesh Patel

Masanobu Sakamoto

Linda Zhang

Takashi Hirano

Saikumar Jayaraman

Dietrich M Fabricius

Ramakrishna Ravikiran

Peter Wyatt Newsome

Etsu Takeuchi

Junya Kusunoki

William DiMenna

Elaine Koronich

Jianyong Jin

Matthew Apanius

Ramakrisha Ravikiran

Carolyn Scherger

Paul D Byrne

Embodiments in accordance with the present invention encompass compositions comprising a soluble photoacid generator, a organopalladium compound, a photosensitizer and one or more olefinic monomers which undergo vinyl addition polymerization when said composition is exposed to a suitable actinic radiation to form a substantially transparent film. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films having various opto-electronic properties. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, among others.

Mass polymerizable polycycloolefin compositions containing soluble photoacid generators

The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain multifunctional crosslinking agents, and two or more phenolic compounds which are resistant to thermo-oxidative chain degradation and exhibit improved mechanical properties.

Photosensitive compositions and applications thereof

Embodiments in accordance with the present invention encompass polyamic acid or polyimide polymers containing a reactive maleimide end group as well as photosensitive compositions made therefrom which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. The negative images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.

Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof

Embodiments in accordance with the present invention provides for the photoalignment layer for liquid crystal displays, a liquid crystal display device using the photoalignment layer and a manufacturing method. The photoalignment layer encompasses polynorbornene (PNB) polymers among other additives. More specifically, embodiments of this invention include a method for the fabrication of a liquid crystal display and the photoalignment layer encompassing the PNB polymers.

Photoalignment film forming composition and LCD devices derived therefrom

Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

Photoimageable polyolefin compositions containing photobase generators

Various vinyl addition polymers of nadic anhydride are disclosed. Examples of such polymers include copolymers and terpolymers of nadic anhydride with a wide variety of norbornene-type monomers. The nadic anhydride polymers are found to be useful in forming a wide variety of photosensitive compositions, both positive and negative, which are capable of forming high resolution imagable films exhibiting excellent dielectric properties (low-k) and thermal properties, and thus are useful in the fabrication of a variety of microelectronic and optoelectronic devices, among others.

Nadic anhydride polymers and photosensitive compositions derived therefrom

Embodiments in accordance with the present invention encompass self-imagable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are capable of controlling the adhesiveness by radiation.

The present invention relates to polynorbornene (PNB) composition embodiments that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs having norbornene-type repeating units that are polyether functionalized and an additive package containing a phenolic antioxidant and a diaryl amine synergist, and the microelectronic and/or optoelectronic devices made therefrom are resistant to thermo-oxidative chain degradation of said polyether functionalization.

Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof

The present invention relates to polynorbornene (PNB) composition embodiments that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs having norbornene-type repeating units that are polyether functionalized and an additive package containing a phenolic antioxidant and a synergist, and the microelectronic and/or optoelectronic devices made therefrom are resistant to thermo-oxidative chain degradation of said polyether functionalization.

The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are resistant to thermo-oxidative chain degradation.

Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imagable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

Aqueous base-developable negative-tone films based on functionalized norbornene polymers

Embodiments of the present invention are directed generally to methods for producing high purity exo-alkenylnorbornenes from a mixture of conformational isomers thereof.

Process for producing high purity exo-alkenylnorbornene

Embodiments in accordance with the present invention provide forming polynorbornenes useful for forming pervaporation membranes, the membranes themselves and methods of making such membranes.

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Brecksville, OH, United States of America

Brian F Knapp