Cymer, Inc.

Other

Brett D Smith

William N Partlo

Richard M Ness

Daniel L Birx

Paul C Melcher

Daniel Anthony Rothweil

Gregg D Scheller

Palash P Das

Stuart L Anderson

Helmut Schillinger

Claus Strowitzki

Stephan Geiger

Tobias Pflanz

Jennan Yu

Claudia A Hartmann

Richard C Ujazdowski

Walter Dale Gillespie

Thomas D Steiger

Vladimir B Fleurov

Bryan George Moosman

J Martin Algots

Frederick A Palenschat

Thomas E McKelvey

Bryan G Moosman

Thomas E Mckelvy

An irrigating bipolar forceps may include a first forceps arm, a conductor tip of the first forceps arm, a second forceps arm, a conductor tip of the second forceps arm, an input conductor isolation mechanism, and irrigation tubing. A proximal end of the first forceps arm may be disposed within the input conductor isolation mechanism and a proximal end of the second forceps arm may be disposed within the input conductor isolation mechanism. An application of a force to a lateral portion of the forceps arms may be configured to close the forceps arms. A reduction of a force applied to a lateral portion of the forceps arms may be configured to open the forceps arms. The irrigation tubing may transport a fluid from an irrigation supply system to a surgical site.

Irrigating bipolar forceps

A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.

6 KHz and above gas discharge laser system

A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an Fgas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

High repetition rate gas discharge laser with precise pulse timing control

A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 4000 charges per second. In a preferred embodiment capable of operating at pulse rates of 2000 to 4000 Hz or greater, water cooling of the saturable inductors is provided.

High pulse rate pulse power system with liquid cooling

A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

High pulse rate pulse power system with fast rise time and low current

A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated resonant power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

High pulse rate pulse power system with resonant power supply

High pulse rate pulse power system

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Cody, WY, United States of America

Brett D Smith