Applied Materials, Inc.

Brett Christian Hoogensen

Mark Naoshi Kawaguchi

Kin Pong Lo

Sandy M Wen

Jagan Rangarajan

Steven H Kim

Dmitry Sklyar

Ricardo Martinez

Hung Xuan Hoang

Farooq Aleem

William Wadsworth

Steven M Kim

In a substrate processing system, such as a chemical mechanical system, updated controller configuration data is obtained for a plurality of liquid flow controllers of the substrate processing system. Each of a plurality of liquid flow controllers (LFCs) coupled to an Ethernet for Control Automation Technology (EtherCAT) bus automatically downloads a copy of the updated controller configuration data through the EtherCAT bus. Each of the plurality of liquid flow controllers controls fluid flow of a separate fluid line from a plurality of fluid lines in the substrate processing system, fluid flow through the plurality of fluid lines is controlled using the plurality of liquid flow controllers having the updated controller configuration data.

Ethercat liquid flow controller communication for substrate processing systems

A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.

Integrated apparatus for efficient removal of halogen residues from etched substrates

Integrated method and apparatus for efficient removal of halogen residues from etched substrates

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Los Gatos, CA, United States of America

Brett Christian Hoogensen