Corning Incorporated

Bradley Frederick Bowden

Adam James Ellison

Timothy James Kiczenski

Kenneth Edward Hrdina

Douglas Clippinger Allan

Marcel Potuzak

John Forrest Wight, Jr

Xiaoju Guo

James Joseph Bernas

Garrett Andrew Piech

Wendell Porter Weeks

Ellen Anne King

Kristopher Allen Wieland

Claude L Davis, Jr

Chunzhe C Yu

Thomas Hackert

Jeremy Nathan Payne

Shriram Palanthandalam Madapusi

Bradford Giles Ackerman

Yang Yang

Douglas Benjamin Rapp

Seann Bishop

Heath Aaron Filkins

Qingang Xiong

Substantially alkali free glasses are disclosed with can be used to produce substrates for flat panel display devices, e.g., active-matrix liquid crystal displays (AMLCDs). The glasses have high annealing temperatures and etch rates. Methods for producing substantially alkali free glasses using a downdraw process (e.g., a fusion process) are also disclosed. Consumer electronic products comprising glass sheets are also disclosed.

Dimensionally stable fast etching glasses

Methods and a glass manufacturing system are described herein that impact compaction in a glass sheet. For instance, a method is described herein for impacting compaction in a glass sheet made by a glass manufacturing system. In addition, a glass manufacturing system is described herein which manufactures a glass sheet that meets a compaction target. Plus, a method is described herein for maintaining an uniform compaction between glass sheets made by different glass manufacturing systems.

Methods and glass manufacturing system for impacting compaction in a glass sheet

A method for cutting, separating and removing interior contoured shapes in thin substrates, particularly glass substrates. The method involves the utilization of an ultra-short pulse laser to form defect lines in the substrate that may be followed by use of a second laser beam to promote isolation of the part defined by the interior contour.

Laser cutting and removal of contoured shapes from transparent substrates

Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature.

Aluminosilicate glasses

Substantially alkali free glasses are disclosed with can be used to produce substrates for flat panel display devices, e.g., active-matrix liquid crystal displays (AMLCDs). The glasses have high annealing temperatures and etch rates. Methods for producing substantially alkali free glasses using a downdraw process (e.g., a fusion process) are also disclosed.

Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties.

Glass with improved total pitch stability

Glass with improved pitch stability

The invention discloses a method for forming substantially striae-free glass substrates that are suitable for optical applications, including use in forming optical elements or structures such as mirrors and platen stage structures that can be used, for example, in EUV lithography. The method includes forming a mixture of silica soot, binder, lubricant and solvent. The homogenized mixture is then extruded through a slit die or mask into a flat planar pre-form, and the extruded pre-form is then consolidated by heating into a substantially full density, substantially striae-free lithography glass substrate structure. The consolidated perform has a substantially uniform coefficient of thermal expansion and is also substantially void free.

EUV lithography glass structures formed by extrusion consolidation process

A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.

Method for making extreme ultraviolet lithography structures

The present invention relates to a method for forming an optical device. The method includes providing a glass aggregate. Typically, the glass aggregate is a mixture of fine glass soot particles and coarser ground or milled glass powder. The glass particles are mixed with a liquid to form a slurry which is cast in a mold to form a porous pre-form. Subsequently, the porous pre-form is consolidated into a glass object by heating the pre-form at a relatively high temperature. The method of the present invention produces optical components having substantially no striae. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from the optical blank.

High purity glass bodies formed by zero shrinkage casting

The present invention relates to a method for forming an optical blank. The method includes providing a green body that has a non-porous exterior portion and a porous interior portion. The interior portion is evacuated to create a vacuum in the interior portion. The green body is then pressed using a hot isostatic pressing technique to densify the green body into a solid glass optical blank. This method produces homogeneous optical blanks having substantially no striae. The method also produces dense, inclusion free glass. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from optical blank employing the method of the present invention.

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Corning, NY, United States of America

Bradley Frederick Bowden