Applied Materials, Inc.

Applied Materials Israel Limited

Boris Goldberg

Ron Naftali

Gilad Almogy

Silviu Reinhorn

Daniel I Some

Amir Moshe Sagiv

Shmuel Mangan

Haim Feldman

On Haran

Ishai Schwarzband

Alexander Libinson

Amir Komem

Chaim Braude

Michael Ben-Yishay

Roman Vander

Hadar Mazaki

Zvi Howard Phillip

An optical system having coherence reduction capabilities includes a light source for generating a first light pulse; an asymmetrical pulse stretcher arranged to receive the first light pulse and to generate multiple light pulses, during a pulse sequence generation period, wherein the asymmetrical pulse stretcher includes multiple optical components which define a loop and a condenser lens is located between the asymmetrical pulse stretcher and an object, for directing the multiple pulses toward an area on the object At least two optical components of the multiple optical components are positioned in an almost symmetrical manner in relation to each other and introduce a coherence-related difference between at least two pulses of the multiple pulses. The pulse sequence generation period does not exceed a response period of a detector.

Method and system for coherence reduction

A system, method and computer readable medium for reticle evaluation, the method includes: (i) obtaining, during an imaging process, multiple images of the reticle under different polarization and optionally interferometric conditions; and (ii) generating an output aerial image in response to (i) the multiple images and (ii) differences between the imaging process and an exposure process; wherein during the exposure process an image of the reticle is projected onto a wafer.

Method and system for aerial imaging of a reticle

System for scanning a surface, comprising a light source producing an illuminating light beam; an objective lens assembly, located between the light source and the surface; a plurality of interchangeable telescopes, a selected one of the interchangeable telescopes being located between the light source and the objective lens assembly; and at least one light detector, wherein at least one of the light detectors detects at least a portion of a reflected light beam, reflected from the surface and received from the selected telescope.

Method and system for detecting defects

System for scanning a surface, including a light source producing an illuminating light beam; an objective lens assembly, located between the light source and the surface; at least one light detector; an apodizator located between the light source and the objective lens assembly; and a relay lens assembly located between the apodizator and the objective lens assembly, wherein the light source produces an image of the illuminating light beam on the apodizator, the apodizator blocks at least a portion of the illuminating light beam, the relay lens assembly images the blocked illuminating light beam at an entrance pupil of the objective lens assembly, and wherein at least one of said at least one light detector, detects light reflected from said surface.

Apparatus for optical assessment of a sample includes a radiation source, adapted to generate a beam of coherent radiation, and traveling lens optics, adapted to focus the beam so as to generate first and second spots on a surface of the sample and to scan the spots together over the surface. The distance between the first and second spots is responsive to a pitch of a repetitive pattern of the sample. Collection optics are positioned to collect the radiation scattered from the first and second spots and to focus the collected radiation so as to generate an interference pattern. A detector detects a change in the interference pattern.

Apparatus and method for dual spot inspection of repetitive patterns

Apparatus for optical inspection includes a source of optical radiation, which is adapted to scan a spot of the radiation over a sample, whereby the radiation is scattered from the spot. A detection system includes at least first and second detectors optically coupled to receive the scattered radiation and to generate respective first and second outputs responsive thereto, the detection system being configured so that the first detector detects variations in the scattered radiation with a greater sensitivity than the second detector, while the second detector saturates at a higher intensity of the scattered radiation than does the first detector. A signal processor is coupled to receive the first and second outputs and to determine, responsive to the outputs, locations of defects on the sample.

Defect detection with enhanced dynamic range

A variable illumination angle inspection system is provided, including a light source providing a light beam and a scanner imparting scanning deflection to the light beam to provide a scanning beam approaching a substrate at a first angle. A deflection element is selectively insertable into an optical path of the scanning beam to deflect the scanning beam so as to cause the scanning beam to approach the substrate at a second angle.

Variable angle illumination wafer inspection system

A polygon scanning system and method is provided wherein two or more light beams impinge at different incident angles on a polygon facet and are sequentially used for scanning the surface of a substrate as the polygon is rotated. Embodiments include a system comprising a polygon having a reflective facet, a rotation mechanism for rotating the polygon, and a light source for directing a plurality of light beams to impinge on the facet such that each light beam impinges on the facet at a different incident angle. Each light beam is reflected by the facet to scan a particular portion of a surface of a substrate during a respective time interval when the rotation mechanism is rotating the polygon. Each of the plurality of light beams is reflected onto the substrate surface using a respective portion of the facet surface, such that the sum of the respective portions of the facet surface used to reflect the light beams is a very large percentage of the total surface area. Thus, the system has a duty cycle of close to 100 percent as well as a high data rate.

Multi-beam polygon scanning system

Method and apparatus for optical inspection of an article are presented. The apparatus comprises an illumination unit and at least one detection unit. The illumination unit generates an incident beam and directs it onto a predetermined region of the article. The detection unit includes a light collection system and a detector. The light collection system collects light scattered from the illuminated region with a predetermined constant maximum collection angle, and utilizes a variable angle design for selectively selecting from collected light at least one light component propagating with a solid angle segment of the maximum collection angle, and directing it to the detector.

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Ashdod, Israel

Boris Goldberg