Applied Materials Israel Limited

Applied Materials, Inc.

Boris Golberg

Haim Feldman

Ron Naftali

Silviu Reinhorn

Emanuel Elyasaf

Nissim Elmaliach

Adam Baer

Gilad Almogy

Yoram Uziel

Juergen Frosien

Avishai Bartov

Alexander Libinson

Igor Krivts (Krayvitz)

Ido Dolev

Amir Moshe Sagiv

Jacob Levin

Amir Komem

Rami Elichai

Benjamin Cohen

Roman Naidis

Uriel Malul

Benny Kirshner

Ron Naftail

A polarizer system is described. The polarizer system comprises at least one polarization beam splitter, a polarization rotator, and a beam combiner. The at least one polarization beam splitter is positioned to receive input radiation beam and to split the input radiation beam directing a first beam portion having a first linear polarization orientation along a first path and a second beam portion having a second linear polarization orientation orthogonal to said first linear polarization orientation along a second path. The polarization rotator is located along said second path and configured to rotate polarization of said beam portion to be parallel to said first linear polarization orientation. The beam combiner is configured and positioned to combine said first and second beam portions to form a common beam having said first linear polarization orientation propagating along a selected optical path.

Polarization optical system

A method for phase retrieval, the method may include (a) obtaining multiple out-of-focus intensity images of one or more point spread function targets; wherein the out-of-focus intensity images are generated by based on residual collected light signals obtained by a residual collection channel of an optical unit having a numerical aperture that exceeds 0.8; and (b) calculating phase information, based on the multiple out-of-focus intensity images and on a vectorial model of the point spread function.

Phase retrieval

A method for high throughput defect detection, the method may include (i) performing, using first detection channels, a simultaneous inspection process through a segmented pupil plane that comprises multiple pupil plane segments to select one or more pupil plane segments of interest out of multiple pupil plane segments; (ii) configuring one or more configurable filters related to second detection channels to pass radiation received from the one or more pupil plane segment of interest and to block radiation received from one or more non-of-interest pupil plane segments; and (iii) performing, using the second detection channels, a partially masked pupil plane inspection process.

High throughput defect detection

A method and a system for obtaining information from a sample. The system may include (i) a spatial filter that includes a blocking element and an aperture; (ii) an illumination unit; and (iii) an optical unit that includes an optical objective assembly. The illumination unit may be configured to illuminate the optical objective assembly with oblique radiation. The optical objective assembly may be configured to (a) focus the oblique radiation onto the sample, (b) collect radiation from the sample to provide collected radiation, and (c) reflect the oblique radiation to provide back reflected radiation. The optical unit may be configured to (a) focus the collected radiation to provide focused collected radiation, (b) direct the focused collection radiation towards the aperture, (c) focus the back reflected radiation to provide focused back reflected radiation, and (d) direct the focused back reflected radiation towards the blocking element.

Method and system for obtaining information from a sample

An illumination module that includes a pair of anamorphic prisms that comprises a first anamorphic prism and a second anamorphic prism; wherein the pair of anamorphic prisms is configured to (a) receive a first radiation beam that propagates along a first optical axis, and (b) asymmetrically magnify the first radiation beam to provide a second radiation beam that propagates along a second optical axis that is parallel to the first optical axis; and a rectangular prism that is configured to receive the second radiation beam and perform a lateral shift of the second radiation beam to provide a third radiation beam; and a rotating mechanism that is configured to change an asymmetrical magnification of the pair of anamorphic prisms by rotating at least one of the first anamorphic prism and the second anamorphic prism.

Asymmetrical magnification inspection system and illumination module

A system for inspecting and reviewing a sample, the system may include a chamber that is arranged to receive the sample and to maintain vacuum within the chamber during at least a scan period; an inspection unit; a review unit; and a mechanical stage for moving the sample, according to a scan pattern and during the scan period, in relation to the inspection unit and the review unit while a spatial relationship between the inspection unit and the review unit remains unchanged; wherein the inspection unit is arranged to detect, during the scan period, multiple suspected defects of the sample; and wherein the review unit is arranged to (a) receive, during the scan period, information about the multiple suspected defects; and (b) locate, during the scan period and in response to the information about the multiple suspected defects, at least one actual defect.

System for inspecting and reviewing a sample

An inspection system that may include an illumination module that may be configured to scan a sample during multiple scan iterations; wherein during each scan iteration the illumination module scans each beam of a plurality of spaced apart beams along a scan line; a mechanical stage that may be configured to move the sample during the multiple scan iterations; a detection module; and a processor; wherein when the inspection system operates in an interlaced mode, the mechanical stage may be configured to move at a first speed thereby preventing a substantial overlap between scan lines obtained during the multiple scan iterations; wherein when the inspection system operates in a non-interlaced mode: the mechanical stage may be configured to move at a second speed that differs from the first speed thereby introducing an overlap between scan lines of different beams that may be obtained during different scan iterations; the detection module may be configured to generate detection signals in response to a detection of radiation emitted from the sample as a result of each scan line; and wherein the processor may be configured to independently process detection signals relating to different scan lines.

Inspection system and method for inspecting a sample by using a plurality of spaced apart beams

A scanning system that includes an illumination module that is configured to scan, at a first direction, an elongated radiation spot over an object; and a collection module that is configured to (a) collect a collected radiation beam from the object, and (b) optically manipulate the collected radiation beam to provide a counter-scan beam is directed towards a set of detection units and has a focal point that is positioned at a same location regardless of the propagation of the elongated radiation spot along the first direction.

Scanning system and method for scanning an object

An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.

On-tool wavefront aberrations measurement system and method

A method and system are presented for use in imaging broadband light. A plurality of substantially narrowband light components of the broadband light are passed through an array of spectral imaging modules. Each of the spectral imaging modules is configured for imaging light of a respective substantially narrow spectral band with minimal aberrations. This technique provides for producing an image with minimal aberrations over the entire spectral range of the broadband light.

Broadband imaging system and method

Apparatus for inspection of a surface, the apparatus including an objective having central and peripheral regions, which is positioned to focus an input beam through the central region in a normal direction onto the surface. The apparatus further includes a first periscope which is positionable to divert the input beam so as to pass through the peripheral region of the objective, whereby the objective focuses the input beam in an oblique direction onto the surface. There is also a second periscope which is positionable to capture radiation reflected from the surface in the oblique direction after passage of the reflected radiation through the peripheral region of the objective.

System for inspecting a surface employing configurable multi angle illumination modes

A system for inspecting a specimen, such as a semiconductor wafer that uses a laser light source for providing a beam of light. The beam is applied to a traveling lens acousto-optic device having an active region and responsive to an RF input signal to selectively generate plural traveling lenses in the active region. The traveling lens acousto-optic device is operative to receive the light beam and generate plural flying spot beams, at the respective focus of each of the generated traveling lenses. A light detector unit, having a plurality of detector sections, each detector section having a plurality of light detectors and at least one multi-stage storage device operative to receive in parallel an input from the plurality of light detectors, is used to generate useable scan data. Information stored in each of the storage devices is serially read out concurrently from the multiple stages.

Wafer defect detection system with traveling lens multi-beam scanner

An apparatus and method for focus error detection operable to receive light reflected from an inspected object and to determine a focus error on a surface of the inspected object, the focus error detection apparatus including optics and at least one detection apparatus, whereas the optics and the at least one detection apparatus define at least a first focus error detection path and a second focus error detection path, the first focus error detection path detects focus errors with a greater sensitivity than the second focus error detection path, while the second focus error detection path detects focus errors over a greater focus error range than the first focus error detection path.

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Ashdod, Israel

Boris Golberg