Semes Co., Ltd.

Bongkyu Shin

Hyun Joong Kim

Soon Cheon Cho

Soon-Cheon Cho

Byeol Han

Disclosed are a coating apparatus and a coating method. The coating apparatus includes a chamber, a support located in an interior space of the chamber and configured to support a substrate which is to be coated, an ejection nozzle configured to eject a coating material toward the support, and an electric field forming unit configured to form an electric field in a movement path of the coating material to provide kinetic energy for the coating material.

Coating apparatus and coating method

Disclosed are an apparatus and a method for cleaning a component of a substrate dry processing apparatus. The method for cleaning a component of a substrate dry processing apparatus includes dipping the component in a cleaning solution received in a cleaning bath, generating radicals from the cleaning solution, and cleaning the component with the radicals. The component is cleaned with hydrogen radicals (H*) and hydroxyl radicals (OH*) generated from ozone water. Accordingly, it is possible to rapidly remove carbon (C) and fluorine (F) deposited on the component.

Growing community of inventors

Chungcheongnam-do, South Korea

Bongkyu Shin